Chemical Vapor Deposition of Zirconium Compounds: A Review

Coatings of zirconium compounds are used in a wide variety of fields, yet an understanding and descriptions of deposition mechanisms are scant in the public literature. The mechanisms of deposition for metallic zirconium, ZrC, ZrN, ZrO2, ZrB2, and zirconium silicides are discussed based on the direct vapor deposition research of those compounds where possible or compared to complementary titanium systems when direct research is lacking. Both inorganic and organometallic deposition systems are discussed. As a class of compounds, an understanding of the vapor deposition mechanisms can be significantly improved by investigations on metallic zirconium deposition by zirconium halides and hydrogen and by in situ analysis techniques such as Fourier-transform infrared (FTIR) spectroscopy or x-ray photoelectron spectroscopy (XPS).

Automated summary

This article discusses the mechanisms of deposition for various zirconium compounds, including metallic zirconium, ZrC, ZrN, ZrO2, ZrB2, and zirconium silicides. It compares them to the deposition mechanisms of titanium systems when direct research is lacking. The discussion includes both inorganic and organometallic deposition systems, and suggests studies on metallic zirconium deposition using zirconium halides and hydrogen, as well as in situ analysis techniques like FTIR spectroscopy or XPS to improve understanding of vapor deposition mechanisms.