Phase-controlled van der Waals growth of wafer-scale 2D MoTe2 layers for integrated high-sensitivity broadband infrared photodetection

Being capable of sensing broadband infrared (IR) light is vitally important for wide-ranging applications from fundamental science to industrial purposes. Two-dimensional (2D) topological semimetals are being extensively explored for broadband IR detection due to their gapless electronic structure and the linear energy dispersion relation. However, the low charge separation efficiency, high noise level, and on-chip integration difficulty of these semimetals significantly hinder their further technological applications. Here, we demonstrate a facile thermal-assisted tellurization route for the van der Waals (vdW) growth of wafer-scale phase-controlled 2D MoTe2 layers. Importantly, the type-II Weyl semimetal 1T'-MoTe2 features a unique orthorhombic lattice structure with a broken inversion symmetry, which ensures efficient carrier transportation and thus reduces the carrier recombination. This characteristic is a key merit for the well-designed 1T'-MoTe2/Si vertical Schottky junction photodetector to achieve excellent performance with an ultrabroadband detection range of up to 10.6 mu m and a large room temperature specific detectivity of over 10(8) Jones in the mid-infrared (MIR) range. Moreover, the large-area synthesis of 2D MoTe2 layers enables the demonstration of high-resolution uncooled MIR imaging capability by using an integrated device array. This work provides a new approach to assembling uncooled IR photodetectors based on 2D materials.

Automated summary

Being able to sense broadband infrared light is crucial for various applications. Two-dimensional topological semimetals have been explored for this purpose due to their electronic structure and energy dispersion relation. However, their limitations in charge separation efficiency, noise level, and integration hinder their use in technology.