Journal
MATERIALS
Volume 16, Issue 2, Pages -Publisher
MDPI
DOI: 10.3390/ma16020664
Keywords
tungsten diboride; high power impulse magnetron sputtering (HiPIMS); hardness; thermal stability; oxidation resistance
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We present the deposition and characterization of tungsten-tantalum diboride (W,Ta)B-2 coatings prepared by the high-power impulse magnetron sputtering technique. We evaluated the influence of pulse duration and substrate bias on the properties of (W,Ta)B-2 films. A high hardness of up to 35 GPa measured by nanoindentation was simultaneously obtained with good elastic properties. Changing the pulse duration greatly affected the B/(W+Ta) atomic ratio, which influenced the properties of the coatings. The deposited films are thermally stable at up to 1000 degrees C in vacuum and are able to withstand oxidation at 500 degrees C.
We present the deposition and characterization of tungsten-tantalum diboride (W,Ta)B-2 coatings prepared by the high-power impulse magnetron sputtering technique. We evaluated the influence of pulse duration and substrate bias on the properties of (W,Ta)B-2 films. A high hardness of up to 35 GPa measured by nanoindentation was simultaneously obtained with good elastic properties. Changing the pulse duration greatly affected the B/(W+Ta) atomic ratio, which influenced the properties of the coatings. The deposited films are thermally stable at up to 1000 degrees C in vacuum and are able to withstand oxidation at 500 degrees C.
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