Template-free lithography for cross-scale channels towards enhancing nanofluidic devices

Nanofluidic devices act a critical role in many inter-/multidisciplinary research fields including single-molecule DNA sequencing and (bio-) chemical detection because of their unique chemical and physics phenomena. Several template-assisted lithography techniques have been individually or synergistically applied to fabricate channels with nanometer to micrometer scales. However, realizing integrated fabrication of cross-scale channels with an atomic precision for emerging demand for device miniaturization and integration remains a significant chal-lenge. Herein, channel with single atom layer depth, which was regarded as ultimate precision of silicon manufacturing, was realized using mechano-chemical scanning probe lithography. From atom-to micro-scale, the channels with hybrid features were also achieved, which can meet the fabrication requirements for all components of nanofluidic devices. The involved selective etching mechanism was addressed based on the proposed dissolution model. The excellent applicability in the field of cross-scale fabrication was demonstrated by label-free enzyme detection using prepared nanofluidic device. This study can significantly promote the development of integrated fabrication and miniaturization for nanofluidic devices.

Automated summary

In this study, channel fabrication with different scales and hybrid features, including channels with single atom layer depth, was successfully achieved using mechano-chemical scanning probe lithography. The selective etching mechanism was explained based on the proposed dissolution model, and the potential applications of nanofluidic devices in cross-scale fabrication were demonstrated.