4.6 Article

Effect of bismuth oxide nanoparticles on the radiation shielding of bentonite clay using Fluka modeling calculations and simulation studying

Journal

PROGRESS IN NUCLEAR ENERGY
Volume 155, Issue -, Pages -

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.pnucene.2022.104494

Keywords

Bentonite clay; Bismuth oxide nanoparticles; Gamma -ray shielding; FLUKA

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This research aims to evaluate the radiation shielding ability of bentonite clay doped with varying amounts of Bi2O3 nanoparticles. The newly designed bentonite/Bi2O3 nanocomposites were analyzed using Monte Carlo software to calculate gamma-ray shielding parameters. The results show that increasing the amount of Bi2O3 nanoparticles enhances the gamma-ray shielding characteristics of the nanocomposites.
This research aims to evaluate the radiation shielding ability of fabricated bentonite clay doped with xBi2O3 nanoparticles (x = 0, 10, 20, 30, and 40 wt%). Gamma-ray shielding parameters for the newly designed bentonite/Bi2O3 nanocomposites were calculated with the help of the Monte Carlo software (FLUKA), for photon energies ranging from 0.015 to 15 MeV. Five shielding parameters were measured including the nanocomposites' mass attenuation coefficient, effective atomic number, electron density, mean free path, and half-value layer. Xray diffraction analysis, Energy dispersive X-ray and the scanning electron microscope were used to investigate the characteristics of the developed nanocomposites (structural and morphological), as well as those of the asprepared Bi2O3 nanoparticles. The findings demonstrated that an increase in the amount of Bi2O3 nanoparticles in the bentonite clay matrix enhances the predicted gamma-ray shielding characteristics of the resulting nanocomposites. As a result, the sample of bentonite clay including 40 wt% Bi2O3 nanoparticles had the highest value for mass attenuation, effective atomic number, and electron density, and the lowest value of mean free path and half-value layer, of all the developed nanocomposites.

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