4.6 Article

Oxygen vacancy dynamics in Pt/TiOx/TaOy/Pt memristors: exchange with the environment and internal electromigration

Journal

NANOTECHNOLOGY
Volume 34, Issue 9, Pages -

Publisher

IOP Publishing Ltd
DOI: 10.1088/1361-6528/aca597

Keywords

oxygen vacancy dinamics; memristive devices; transition metal oxide thin films

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In this study, it is demonstrated that there is an exchange of oxygen vacancies (OV) between the device and the environment in Pt/TiOx/TaOy/Pt devices under electrical stress, but this exchange is suppressed once the device is stabilized. The memristive behavior is determined by the internal electromigration between the TiOx and TaOy layers.
Memristors are expected to be one of the key building blocks for the development of new bio-inspired nanoelectronics. Memristive effects in transition metal oxides are usually linked to the electromigration at the nanoscale of charged oxygen vacancies (OV). In this paper we address, for Pt/TiO x /TaO y /Pt devices, the exchange of OV between the device and the environment upon the application of electrical stress. From a combination of experiments and theoretical simulations we determine that both TiO x and TaO y layers oxidize, via environmental oxygen uptake, during the electroforming process. Once the memristive effect is stabilized (post-forming behavior) our results suggest that oxygen exchange with the environment is suppressed and the OV dynamics that drives the memristive behavior is restricted to an internal electromigration between TiO x and TaO y layers. Our work provides relevant information for the design of reliable binary oxide memristive devices.

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