4.6 Article

Enhancement of temperature-modulated NbO2-based relaxation oscillator via interfacial and bulk treatments

Journal

NANOTECHNOLOGY
Volume 34, Issue 18, Pages -

Publisher

IOP Publishing Ltd
DOI: 10.1088/1361-6528/acb778

Keywords

insulator-metal transition; current-controlled negative differential resistance; relaxation oscillator; argon plasma treatment; temperature-modulated frequency tuning

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This work demonstrates oscillation frequency modulation in a NbO2-based relaxation oscillator device, where the oscillation frequency increases with temperature and voltage, and decreases with load resistance. Annealing at 373 K was conducted to optimize the stoichiometry of the bulk NbO2 for consistent frequency shift. The device exhibits stable self-sustained oscillation, with frequency tunability between 2 and 33 MHz and a wider voltage range.
This work demonstrates oscillation frequency modulation in a NbO2-based relaxation oscillator device, in which the oscillation frequency increases with operating temperature and source voltage, and decreases with load resistance. An annealing-induced oxygen diffusion at 373 K was carried out to optimize the stoichiometry of the bulk NbO2 to achieve consistent oscillation frequency shift with device temperature. The device exhibits stable self-sustained oscillation in which the frequency can be modulated between 2 and 33 MHz, and a wider operating voltage range can be obtained. An additional surface treatment step was employed during fabrication to reduce the surface roughness of the bottom electrode and to remove surface contaminants that affect the interfacial properties of the device. The device frequency tunability coupled with high oscillating frequency and high endurance capability of more than 1.5 x 10(8) cycles indicates that the Pt/NbO2/Pt device is particularly suitable for applications in an oscillatory neural network.

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