☆ 4.0 Article

Photosensitive Polyimide-silicone Copolymer based on Reaction Development Patterning (RDP)

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY (2016)

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Journal

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
Volume 29, Issue 2, Pages 273-276

Publisher

Technical Association of Photopolymers, Japan
DOI: 10.2494/photopolymer.29.273

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Polymer Science

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