4.5 Article

Epitaxial growth of the first two members of the Ban+1InnO2.5n+1 Ruddlesden-Popper homologous series

Journal

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 40, Issue 6, Pages -

Publisher

A V S AMER INST PHYSICS
DOI: 10.1116/6.0002205

Keywords

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Funding

  1. National Science Foundation [DMR-2039380, NNCI-2025233]
  2. NSF MRSEC program [DMR-1719875]
  3. NSF GRFP [DGE-2139899]
  4. Gordon and Betty Moore Foundation [GBMF9073]
  5. Alexander von Humboldt foundation
  6. Feodor Lynen fellowship

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Epitaxial growth of the first two members and the n = infinity member of the homologous Ruddlesden-Popper series of Ban + 1Inn O-2.5 (n + 1) has been demonstrated. The films were grown using suboxide molecular-beam epitaxy, and the structural quality was assessed using various techniques, such as X-ray diffraction and electron microscopy.
We demonstrate the epitaxial growth of the first two members, and the n = infinity member of the homologous Ruddlesden-Popper series of Ban + 1Inn O-2.5 (n + 1) of which the n = 1 member was previously unknown. The films were grown by suboxide molecular-beam epitaxy where the indium is provided by a molecular beam of indium-suboxide [ In2O (g)]. To facilitate ex situ characterization of the highly hygroscopic barium indate films, a capping layer of amorphous SiO2 was deposited prior to air exposure. The structural quality of the films was assessed by x-ray diffraction, reflective high-energy electron diffraction, and scanning transmission electron microscopy. (C) 2022 Author(s).

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