4.7 Article

Facile synthesis of SrWO4@MIL-88A(Fe) heterojunctions and their deep treatment of dye wastewater and municipal landfill leachate using photo-Fenton technology

Journal

JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY
Volume 120, Issue -, Pages 103-120

Publisher

ELSEVIER SCIENCE INC
DOI: 10.1016/j.jiec.2022.12.014

Keywords

MB; Landfill leachate; Photo-Fenton; SrWO4@MIL-88A(Fe)

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In this study, SrWO4@MIL-88A(Fe) composites were prepared through room temperature synthesis. The photo-Fenton process of SrWO4@MIL-88A(Fe) was employed for the systematic degradation of methylene blue (MB) and landfill leachate. The results demonstrated that SrWO4@MIL-88A(Fe) could efficiently degrade MB and reduce the pollutants in the leachate, providing a purification pathway for dual-effect treatment.
Dye wastewater and municipal landfill leachate greatly threaten the ecological environment and human health. We prepared SrWO4@MIL-88A(Fe) composites in this work by room temperature synthesis. A sys-tematic degradation study of methylene blue (MB) and landfill leachate was carried out using the photo -Fenton process. The results showed that SrWO4@MIL-88A(Fe) could degrade 93.75 % of MB within four min. Within 15 min of sunlight irradiation, SrWO4@MIL-88A(Fe) could degrade up to 95 % of MB. It could eliminate up to 87.19 % of COD, 90.23 % of BOD5, 99.50 % of TOP-P, 80.96 % of TOP-N, and 81.48 % of NH3- N in the leachate. The toxicity of the deep-purified leachate is significantly reduced, and alfalfa seeds can use the remaining organic matter in the leachate to germinate and grow, thus achieving self-purification of the detoxified leachate. In addition, the photo-Fenton technology can effectively kill the bacterial microorganisms in the leachate and reduce the epidemiological hazard to organisms. In conclusion, the photo-Fenton process of SrWO4@MIL-88A(Fe) provides a purification pathway for the dual-effect treatment of MB and municipal landfill leachate.(c) 2022 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.

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