4.3 Article

High-mobility 4 μm MOVPE-grown (100) β-Ga2O3 film by parasitic particles suppression

Related references

Note: Only part of the references are listed.
Article Physics, Applied

Growth of bulk β-Ga2O3 single crystals by the Czochralski method

Zbigniew Galazka

Summary: This Tutorial provides a detailed description of the critical aspects of bulk beta-Ga2O3 single crystal growth using the Czochralski method. It covers the thermodynamics of Ga2O3, comprehensive solutions for crystal size scale-up, the impact of free carrier absorption on growth stability, and important factors such as crystal growth direction and intentional doping. The resulting crystals' structural quality and basic physical properties are also discussed.

JOURNAL OF APPLIED PHYSICS (2022)

Article Physics, Applied

Two inch diameter, highly conducting bulk β-Ga2O3 single crystals grown by the Czochralski method

Zbigniew Galazka et al.

Summary: Two inch diameter highly conducting (Si-doped) beta-Ga2O3 single crystals with high structural quality and surface smoothness were grown by the Czochralski method, making them suitable substrates for homoepitaxy and electronic device fabrication.

APPLIED PHYSICS LETTERS (2022)

Article Chemistry, Multidisciplinary

High-Mobility MOCVD β-Ga2O3 Epitaxy with Fast Growth Rate Using Trimethylgallium

Lingyu Meng et al.

Summary: In this study, high-quality Ga2O3 thin films were successfully grown with fast growth rates using metalorganic chemical vapor deposition (MOCVD). Key growth parameters and the flow rate of n-type dopant silane were adjusted to achieve high crystalline quality, high mobility, and low compensation level. These results are crucial for the development of high power electronic device technology.

CRYSTAL GROWTH & DESIGN (2022)

Article Physics, Applied

Si doping mechanism in MOVPE-grown (100) β-Ga2O3 films

Ta-Shun Chou et al.

Summary: (English Summary:) This study proposes a Langmuir adsorption model for the Si incorporation mechanism into (100) beta-Ga2O3 thin films grown by metalorganic vapor-phase epitaxy, based on the competitive surface adsorption process between Si and Ga atoms. The model describes the major features of the doping process and shows a growth rate-dependent doping behavior, which is experimentally validated and further generalized to different growth conditions and substrate orientations.

APPLIED PHYSICS LETTERS (2022)

Article Crystallography

Machine learning supported analysis of MOVPE grown β-Ga2O3 thin films on sapphire

Ta-Shun Chou et al.

Summary: This study demonstrates the use of Random Forest, a machine learning approach, for predicting the growth rate of beta-Ga2O3 in metal-organic vapor phase epitaxy (MOVPE) by analyzing its growth process on sapphire. The proposed model can effectively evaluate the complex non-linear dependencies among growth parameters and optimize them to achieve the optimal growth rate. It achieves a high predictive power with a coefficient of determination (R-2) of 0.95 and 0.92 for the training and testing sets, respectively. The model's outcome is applicable to both homoepitaxial and heteroepitaxial processes, as well as different substrate orientations.

JOURNAL OF CRYSTAL GROWTH (2022)

Article Physics, Applied

Impact of chamber pressure and Si-doping on the surface morphology and electrical properties of homoepitaxial (100) β-Ga2O3 thin films grown by MOVPE

S. Bin Anooz et al.

Summary: The study investigated the impact of chamber pressure and Si-doping on the growth of beta-Ga2O3 thin films, resulting in changes in growth modes and electron mobility. High-quality homoepitaxial thin films of beta-Ga2O3 were obtained under optimal conditions.

JOURNAL OF PHYSICS D-APPLIED PHYSICS (2021)

Article Physics, Applied

Thermodynamic and experimental studies of β-Ga2O3 growth by metalorganic vapor phase epitaxy

Ken Goto et al.

Summary: Thermodynamic analysis and experimental demonstration were performed on the growth of beta-Ga2O3 by metalorganic vapor phase epitaxy using TEG and O-2 precursors. The study found that high temperatures and input VI/III ratios are necessary for complete combustion of hydrocarbons and H-2, and the use of an inert gas as a carrier gas is also essential for high-temperature beta-Ga2O3 growth. An oriented smooth beta-Ga2O3 layer was successfully grown on a c-plane sapphire substrate at 900 degrees C with specific growth conditions.

JAPANESE JOURNAL OF APPLIED PHYSICS (2021)

Article Crystallography

Growth of (100), (010) and (001) β-Ga2O3 single crystals by vertical Bridgman method

Etsuko Ohba et al.

Summary: The growth of beta-Ga2O3 single crystals with three different growth orientations perpendicular to the (100), (010) and (001) planes was investigated using the vertical Bridgman method. Different etching rates due to the anisotropy of beta-Ga2O3 were observed through selective etching using H3PO4, and line-shaped defects extending in the [010] direction were observed in the grown crystals.

JOURNAL OF CRYSTAL GROWTH (2021)

Article Nanoscience & Nanotechnology

Fast homoepitaxial growth of (100) β-Ga2O3 thin films via MOVPE

Ta-Shun Chou et al.

Summary: The study successfully achieved a high growth rate and high crystalline perfection for Si-doped (100) beta-Ga2O3 homoepitaxial films grown via MOVPE. Si doping allowed precise control of the n-type conductivity of the films, providing a critical technological advancement for high power electronics.

AIP ADVANCES (2021)

Article Physics, Applied

Stacking faults: Origin of leakage current in halide vapor phase epitaxial (001) β-Ga2O3 Schottky barrier diodes

Sayleap Sdoeung et al.

Summary: Killer defects in beta-Gallium Oxide (beta-Ga2O3) Schottky barrier diodes, responsible for leakage current and breakdown, are mainly stacking faults in the halide vapor phase epitaxial (HVPE) (001) layer, including (111) and (1 1 1) stacking faults, and stacking faults formed by microparticles due to low gas flow rate during HVPE growth. These defects result in different levels of leakage current at -200V and are characterized by heart-shaped and bullet-shaped etch pits.

APPLIED PHYSICS LETTERS (2021)

Article Physics, Applied

Step flow growth of β-Ga2O3 thin films on vicinal (100) β-Ga2O3 substrates grown by MOVPE

S. Bin Anooz et al.

APPLIED PHYSICS LETTERS (2020)

Article Engineering, Electrical & Electronic

Challenges to overcome breakdown limitations in lateral β-Ga2O3 MOSFET devices

Kornelius Tetzner et al.

MICROELECTRONICS RELIABILITY (2020)

Article Nanoscience & Nanotechnology

Low pressure chemical vapor deposition of β-Ga2O3 thin films: Dependence on growth parameters

Zixuan Feng et al.

APL MATERIALS (2019)

Article Physics, Applied

MOCVD homoepitaxy of Si-doped (010) β-Ga2O3 thin films with superior transport properties

Zixuan Feng et al.

APPLIED PHYSICS LETTERS (2019)

Article Nanoscience & Nanotechnology

Low temperature electron mobility exceeding 104 cm2/V s in MOCVD grown β-Ga2O3

Fikadu Alema et al.

APL MATERIALS (2019)

Editorial Material Physics, Applied

Guest Editorial: The dawn of gallium oxide microelectronics

Masataka Higashiwaki et al.

APPLIED PHYSICS LETTERS (2018)

Review Engineering, Electrical & Electronic

beta-Ga2O3 for wide-bandgap electronics and optoelectronics

Zbigniew Galazka

SEMICONDUCTOR SCIENCE AND TECHNOLOGY (2018)

Article Materials Science, Multidisciplinary

Scaling-Up of Bulk β-Ga2O3 Single Crystals by the Czochralski Method

Zbigniew Galazka et al.

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2017)

Article Materials Science, Multidisciplinary

Si- and Sn-Doped Homoepitaxial β-Ga2O3 Layers Grown by MOVPE on (010)-Oriented Substrates

Michele Baldini et al.

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2017)

Article Materials Science, Multidisciplinary

Temperature and doping concentration dependence of the energy band gap in β-Ga2O3 thin films grown on sapphire

Subrina Rafique et al.

OPTICAL MATERIALS EXPRESS (2017)

Article Physics, Applied

Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer

Man Hoi Wong et al.

JAPANESE JOURNAL OF APPLIED PHYSICS (2016)

Review Physics, Applied

High-quality β-Ga2O3 single crystals grown by edge-defined film-fed growth

Akito Kuramata et al.

JAPANESE JOURNAL OF APPLIED PHYSICS (2016)

Article Physics, Condensed Matter

Brillouin zone and band structure of β-Ga2O3

Hartwin Peelaers et al.

PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS (2015)

Article Physics, Applied

Homoepitaxial growth of beta-Ga2O3 layers by halide vapor phase epitaxy

Hisashi Murakami et al.

Applied Physics Express (2015)

Article Physics, Applied

Systematic investigation of the growth rate of β-Ga2O3(010) by plasma-assisted molecular beam epitaxy

Hironori Okumura et al.

APPLIED PHYSICS EXPRESS (2014)

Review Chemistry, Multidisciplinary

Mechanisms of Nucleation and Growth of Nanoparticles in Solution

Nguyen T. K. Thanh et al.

CHEMICAL REVIEWS (2014)

Article Crystallography

On the bulk β-Ga2O3 single crystals grown by the Czochralski method

Zbigniew Galazka et al.

JOURNAL OF CRYSTAL GROWTH (2014)

Article Multidisciplinary Sciences

Competitive growth mechanisms of AlN on Si (111) by MOVPE

Yuxia Feng et al.

SCIENTIFIC REPORTS (2014)

Article Crystallography

MBE grown Ga2O3 and its power device applications

Kohei Sasaki et al.

JOURNAL OF CRYSTAL GROWTH (2013)

Article Physics, Applied

Device-Quality β-Ga2O3 Epitaxial Films Fabricated by Ozone Molecular Beam Epitaxy

Kohei Sasaki et al.

APPLIED PHYSICS EXPRESS (2012)

Article Crystallography

Nature of the parasitic chemistry during AlGaInNOMVPE

JR Creighton et al.

JOURNAL OF CRYSTAL GROWTH (2004)