4.6 Article

Analysis of Impact Ionization Effects on Current Collapse of AlGaN/GaN HEMTs

Journal

IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 69, Issue 11, Pages 6028-6034

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2022.3208853

Keywords

Logic gates; Impact ionization; Wide band gap semiconductors; Aluminum gallium nitride; MODFETs; HEMTs; Electric breakdown; 2-D analysis; buffer trap; current collapse; GaN HEMT; hole capturing; impact ionization

Funding

  1. JSPS KAKENHI [JP16K06314]

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Computer-aided analysis is performed to investigate the impact ionization effects on turn-on characteristics or current collapse of AlGaN/GaN HEMTs. The study reveals that considering impact ionization and higher drain voltage can weaken the current collapse.
Computer-aided analysis of impact ionization effects on turn-on characteristics or current collapse of AlGaN/GaN HEMTs is performed. Here, an intrinsic semi-insulating buffer is adopted in which deep donors are assumed to compensate deep acceptors, then the ionized deep donor usually plays a role as an electron trap. Calculated turn-on characteristics show that when impact ionization is not included, the drain current begins to increase relatively slowly because electrons are emitted from the deep donors, showing a large current collapse. On the other hand, when impact ionization is included and an ON-state drain voltage V-DON is high, generated holes between the gate and drain flow toward the buffer and are captured by neutral deep donors, particularly at the source side. The hole capturing time becomes relatively short when V-DON is high and the hole density is high. Because of these increases in positive space charges in the buffer, the drain current increases relatively fast before the electron emission under the gate starts. Therefore, the current collapse becomes weaker when the impact ionization is considered and V-DON is higher. The situation may be similar with a different type of buffer such as an Fe-doped semi-insulating buffer in which the Fe-originated level (deep acceptor) is above the midgap and it usually plays a role as an electron trap.

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