4.6 Article

Triple-Node FinFET With Non-Ohmic Schottky Junctions for Synaptic Devices

Journal

IEEE ELECTRON DEVICE LETTERS
Volume 44, Issue 1, Pages 40-43

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2022.3223048

Keywords

Artificial synapse; charge trap layer; Schottky junction; synaptic device; TriNo-FinFET

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This study demonstrates a triple-node FinFET (TriNo-FinFET) with non-ohmic Schottky junctions for an artificial synapse. The TriNo-FinFET utilizes three mechanisms: thermionic emission in a subthreshold region, tunneling in a transition region, and drift transport in an inversion region. The transition region, dominated by tunneling with non-ohmic Schottky junctions, improves the linearity of potentiation and depression. An average recognition rate of 90% for handwritten digits in the MNIST dataset is achieved. Moreover, the TriNo-FinFET with a double-layered charge trap layer (CTL) shows enhanced weight-update speed by up to 48-fold compared to that with a single-layered CTL.
A triple-node FinFET (TriNo-FinFET) with non-ohmic Schottky junctions is demonstrated for an artificial synapse. The three mechanisms of thermionic emission in a subthreshold region, tunneling in a transition region, and drift transport in an inversion region are utilized in the TriNo-FinFET with non-ohmic Schottky junctions. The transition region dominated by tunneling with non-ohmic Schottky junctions improves the linearity of potentiation and depression. An average recognition rate of 90 % for handwritten digits in the MNIST dataset is achieved. Moreover, the TriNo-FinFET with the double-layered charge trap layer (CTL) shows enhanced weight-update speed by up to 48-fold compared to that with a single-layered CTL.

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