4.6 Article

Identification of carbon location in p-type GaN: Synchrotron x-ray absorption spectroscopy and theory

Journal

APPLIED PHYSICS LETTERS
Volume 121, Issue 25, Pages -

Publisher

AIP Publishing
DOI: 10.1063/5.0132130

Keywords

-

Funding

  1. National Natural Science Foundation of China
  2. National Key Research and Development Program of China
  3. Beijing Municipal Science and Technology Project
  4. Key Research and Development Program of Guangdong Province
  5. NSAF
  6. [61922001]
  7. [61927806]
  8. [12088101]
  9. [2021YFB3600901]
  10. [2018YFE0125700]
  11. [Z211100004821007]
  12. [2020B010171002]
  13. [U1930402]

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By combining experimental observations and first-principles simulations, it was found that in p-type GaN, the C impurity mainly occupies the N site rather than the Ga site, and this phenomenon is attributed to an H-induced E-F tuning effect. This work not only provides clear evidence for C defect formation in p-GaN, but also significantly contributes to understanding the role of C-related hole-killers in the electrical and optoelectrical properties of p-GaN and even p-AlGaN.
Identifying atomic configurations of impurities in semiconductors is of fundamental interest and practical importance in designing electronic and optoelectronic devices. C impurity acting as one of the most common impurities in GaN, it is believed for a long time that it substitutes at Ga site forming C-Ga with +1 charge-state in p-type GaN, while it substitutes at N site forming C-N with -1 charge-state in n-type GaN. However, by combining x-ray absorption spectroscopy and first-principles simulations, we observed that C is mainly occupying the N site rather than the Ga one in p-GaN. We further reveal that this is due to an H-induced E-F-tuning effect. During growth, the existing H can passivate Mg dopants and upshifts the E-F to the upper region of bandgap, leading to the C-N formation. After the p-type activation by annealing out H, although the E-F is pushed back close to the valence band maximum, whereas the extremely large kinetic barrier can prevent the migration of C from the metastable C-N site to ground-state C-Ga site, hence stabilizing the C-N configuration. Additionally, the C-N with neutral charge-state ( C-N(0)) in the p-GaN is further observed. Therefore, the real C-related hole-killer in p-type GaN could be C-N rather than the commonly expected C-Ga. Our work not only offers the unambiguous evidence for the C defect formation in p-GaN but also contributes significantly to an in-depth understanding of the C-related hole-killers and their critical role on electrical and optoelectrical properties of p-GaN and even p-AlGaN.

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