4.6 Article

Sunlight-assisted ferroelectric domain switching and ionic migration in Sn-based ferroelectric

Journal

APPLIED PHYSICS LETTERS
Volume 121, Issue 19, Pages -

Publisher

AIP Publishing
DOI: 10.1063/5.0113665

Keywords

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Funding

  1. National Natural Science Foundation of China
  2. National Key Research and Development Program of China
  3. Beijing Natural Science Foundation
  4. Beijing Institute of Technology Research Fund Program for Young Scholars
  5. [12172047]
  6. [92163101]
  7. [12202056]
  8. [2019YFA0307900]
  9. [Z190011]

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This study demonstrates the sunlight-assisted ferroelectric domain switching in Sn2P2S6 single crystals by employing simulated sunlight illumination. The localized carrier concentration of Sn ions is enhanced, inducing an additional internal field and assisting domain switching. The migration and accumulation of Sn ions are also verified, which can be utilized as a resistive memory prototype.
Laser-assisted ferroelectric polarization switching recently has been proved to be an effective mean to manipulate the ferroelectric domain structure, but with the possibility to damage the specimen surface due to high energy input and large thermal expansion. Compared to laser, sunlight with moderate energy is expected to be more accessible. Here, we employed a simulated sunlight illumination instead of high-energy lasers to realize the sunlight-assisted ferroelectric domain switching in Sn2P2S6 single crystals. The origin is the enhancement of localized carrier concentration due to the disproportionation reaction of Sn ions, which induces an additional internal field and assists the domain switching. The migration and accumulation of the Sn ions are also verified with scanning probe technique, which can be utilized as a resistive memory prototype. It is noteworthy that this memory effect can be significantly enhanced by sunlight illumination and, thus, make it suitable for the sunlight control of ferroelectric domain switching and ionic memory devices. Published under an exclusive license by AIP Publishing.

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