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Van der Waals Layer Transfer of 2D Materials for Monolithic 3D Electronic System Integration: Review and Outlook

Journal

ACS NANO
Volume 17, Issue 3, Pages 1831-1844

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsnano.2c10737

Keywords

two-dimensional materials; transition metal dichalcogenides; monolithic three-dimensional integration; van der Waals layer transfer; wafer-scale and high-yield layer transfer; metal-assisted layer transfer; two-dimensional material template-assisted van der Waals transfer; multifunctional three-dimensional integrated electronics

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Two-dimensional materials have attracted attention for their potential in scientific breakthroughs and technological innovations. The integration of 2DMs on Si CMOS platform or flexible electronics has gained interest for applications such as back-end-of-line transistors, memory devices/ selectors, and sensors. The successful transfer of 2DM layers from growth substrate to Si is crucial for these applications, and various transfer methods leveraging van der Waals transfer capability have been developed. This review surveys and compares these transfer methods, focusing on 2D TMDC film transfer and 2DM template-assisted van der Waals growth/transfer of non-2D thin films.
Two-dimensional materials (2DMs) have attracted a great deal of interest due to their immense potential for scientific breakthroughs and technological innovations. While some 2D transition metal dichalcogenides (TMDC) such as MoS2 and WS2 are considered as the ultimate channel materials in unltrascaled transistors as replacements for Si, there has also been increasing interest in the monolithic 3D integration of 2DMs on the Si CMOS platform or in flexible electronics as back-end-of-line transistors, memory devices/ selectors, and sensors, taking advantage of 2DM properties such as a high current driving capability with low leakage current, nonvolatile switching characteristics, a large surface-to-volume ratio, and a tunable bandgap. However, the realization of both of these scenarios critically depends on the development of manufacturing-viable high-yield 2DM layers transfer from the growth substrate to the Si, since the growth of high-quality 2DM layers often requires a high-temperature growth process on template substrates. Motivated by this, extensive efforts have been made by the 2DM research community to develop various 2DM layer transfer methods, leveraging the van der Waals transfer capability of the layer-structured 2DMs. These efforts have led to a number of successful demonstrations of wafer-scale 2D TMDC layer transfer, while 2DM-enabled template growth/ transfer of some functional bulk materials such as III-V, Ge, and AlN has also been demonstrated. This review surveys and compares different 2DM transfer methods developed recently, with a focus on large-area 2D TMDC film transfer along with an introduction of 2DM template-assisted van der Waals growth/transfer of non-2D thin films. We will also briefly present an outlook of our envisioned multifunctionalities in 3D integrated electronic systems enabled by monolithic 3D integration of 2DMs and III-V via van der Waals transfer and discuss possible technology options for overcoming remaining challenges.

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