4.7 Article

Silicon-Induced Tolerance against Arsenic Toxicity by Activating Physiological, Anatomical and Biochemical Regulation in Phoenix dactylifera (Date Palm)

Journal

PLANTS-BASEL
Volume 11, Issue 17, Pages -

Publisher

MDPI
DOI: 10.3390/plants11172263

Keywords

date palm; antioxidants system; silicon; arsenic toxicity; organic acids; ABA; SA

Categories

Funding

  1. internal research fund of University of Nizwa
  2. National Research Foundation of Korea (NRF) - Korean Government (MSIT) [2022R1A2C1008993]
  3. National Research Foundation of Korea [2022R1A2C1008993] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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This study investigates the influence of silicon on date palm under arsenic toxicity, and finds that silicon can effectively mitigate the toxic effects of arsenic by reducing oxidative stress and lipid peroxidation. Moreover, silicon enhances resistance by modulating endogenous hormone levels. Gene expression analysis reveals that silicon upregulates several genes involved in cellular physiology and nutrient transport.
Arsenic is a toxic metal abundantly present in agricultural, industrial, and pesticide effluents. To overcome arsenic toxicity and ensure safety for plant growth, silicon (Si) can play a significant role in its mitigation. Here, we aim to investigate the influence of silicon on date palm under arsenic toxicity by screening antioxidants accumulation, hormonal modulation, and the expression profile of abiotic stress-related genes. The results showed that arsenic exposure (As: 1.0 mM) significantly retarded growth attributes (shoot length, root length, fresh weight), reduced photosynthetic pigments, and raised reactive species levels. Contrarily, exogenous application of Si (Na2SiO3) to date palm roots strongly influenced stress mitigation by limiting the translocation of arsenic into roots and shoots as compared with the arsenic sole application. Furthermore, an enhanced accumulation of polyphenols (48%) and increased antioxidant activities (POD: 50%, PPO: 75%, GSH: 26.1%, CAT: 51%) resulted in a significant decrease in superoxide anion (O-2(center dot-): 58%) and lipid peroxidation (MDA: 1.7-fold), in silicon-treated plants, compared with control and arsenictreated plants. The Si application also reduced the endogenous abscisic acid (ABA: 38%) under normal conditions, and salicylic acid (SA: 52%) and jasmonic acid levels (JA: 62%) under stress conditions as compared with control and arsenic. Interestingly, the genes; zeaxanthin epoxidase (ZEP) and 9-cis-epoxycarotenoid dioxygenase (NCED-1) involved in ABA biosynthesis were upregulated by silicon under arsenic stress. Likewise, Si application also upregulated gene expression of plant plasma membrane ATPase (PMMA-4), aluminum-activated malate transporter (ALMT) responsible for maintaining cellular physiology, stomatal conductance, and short-chain dehydrogenases/reductases (SDR) involved in nutrients translocation. Hence, the study demonstrates the remarkable role of silicon in supporting growth and inducing arsenic tolerance by increasing antioxidant activities and endogenous hormones in date palm. The outcomes of our study can be employed in further studies to better understand arsenic tolerance and decode mechanism.

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