Magnetron Deposition of Cr Coatings with RF-ICP Assistance

The article describes a comparative analysis of chromium coatings deposited by magnetron sputtering with and without ion assistance induced by a radiofrequency inductively coupled plasma (RF-ICP) source. Four series of 2 mu m-thick Cr coatings were prepared, and then their cross-sectional microstructure, crystal structure and corrosion resistance were investigated by scanning and transmission electron microscopy, X-ray diffraction and a potentiodynamic polarization method. RF-ICP assistance led to significant enhancement (almost twofold) of ion current density in a substrate. The role of RF-ICP assistance in coating properties for planetary-rotated substrates was defined in terms of ion-to-atom ratio in particle flux entering a substrate. Calculations of particle and ion flux densities revealed an increase in ion-to-atom ratio from 0.18 to 1.43 and 0.11 to 0.84 in substrate positions distant from the magnetron sputtering systems depending on their design. RF-ICP assistance is beneficial for depositing dense Cr coatings with increased corrosion resistance in a 3.5 wt.% NaCl solution. The corrosion rate of AISI 321 steel can be decreased from 6.2 x 10(-6) to 4.0 x 10(-)(8) mm/year by deposition of the dense Cr coating.

Automated summary

This article presents a comparative analysis of chromium coatings deposited by magnetron sputtering with and without ion assistance induced by a RF-ICP source. The results show that RF-ICP assistance significantly enhances ion current density and improves corrosion resistance of the coatings.