Related references
Note: Only part of the references are listed.Single-Event Burnout Hardening 4H-SiC UMOSFET Structure
Junghun Kim et al.
IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY (2022)
Effect of the Oxidation Process on Carrier Lifetime and on SF Defects of 4H SiC Thick Epilayer for Detection Applications
Alessandro Meli et al.
MICROMACHINES (2022)
Influence of Radiation-Induced Displacement Defect in 1.2 kV SiC Metal-Oxide-Semiconductor Field-Effect Transistors
Gyeongyeop Lee et al.
MICROMACHINES (2022)
A Multiepi Superjunction MOSFET With a Lightly Doped MOS-Channel Diode for Improving Reverse Recovery
Mingmin Huang et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2021)
Numerical Study of SiC MOSFET With Integrated n-/n-Type Poly-Si/SiC Heterojunction Freewheeling Diode
Hengyu Yu et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2021)
A Novel Split-Gate-Trench MOSFET Integrated With Normal Gate and Built-In Channel Diode
Xinyu Li et al.
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY (2021)
SiC Trench MOSFET With Reduced Switching Loss and Increased Short-Circuit Capability
Tongtong Yang et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2020)
Impact of the transition region between active area and edge termination on electrical performance of SiC MOSFET
Shaoyu Liu et al.
SOLID-STATE ELECTRONICS (2020)
Design and Optimization of 1.2-kV SiC Planar Inversion MOSFET Using Split Dummy Gate Concept for High-Frequency Applications
Pavan Vudumula et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2019)
Heterojunction Diode Shielded SiC Split-Gate Trench MOSFET With Optimized Revere Recovery Characteristic and Low Switching Loss
Junjie An et al.
IEEE ACCESS (2019)
Fabrication and Characterization of 1700V 4H-SiC Vertical Double-Implanted Metal-Oxide-Semiconductor Field-Effect Transistors
Shen Hua-Jun et al.
CHINESE PHYSICS LETTERS (2015)
Effect of basal plane dislocations on characteristics of diffused 4H-SiC p-i-n diodes
A Grekov et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2005)
Effect of process variations and ambient temperature on electron mobility at the SiO2/4H-SiC interface
CY Lu et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2003)