Journal
CARBON
Volume 95, Issue -, Pages 664-671Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.carbon.2015.08.070
Keywords
Pre-doping; Normal doping; Combined doping; Mesh-grid; Cl radical; ICP system; Resistance; Transmittance
Funding
- Nano Material Technology Development Program through the National Research Foundation of Korea (NRF) - Ministry of Education, Science and Technology [2012M3A7B4035323]
- Basic Science Research Program through the National Research Foundation of Korean (NRF) - Ministry of Education [2015R1D1A4A01020731]
- National Research Foundation of Korea [2015R1D1A4A01020731] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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This study reports a novel approach for chlorine doping of graphene using low-energy plasma in a low damage inductively coupled plasma (ICP) system, which results in significant reduction (similar to 60%) of the sheet resistance while maintaining high optical transparency. The chemical vapor deposited graphene on Cu (graphene/Cu foil) was directly doped with low-damage chlorine plasma before transferring to the substrate, i.e. pre-doped, in addition to the normal doping conducted after the transfer. Some of the pre-doped chlorine remained on the graphene surface even after the wet transfer to the substrate due to strong C-Cl bonds formed at the graphene defect site. This technique allowed us to achieve the highest chlorine doping ever reported, 47.2%, through combination of pre-doping with conventional doping. By this additional pre-doping on graphene/copper foil (that is, 90 s pre-doping + 90 s normal doping), a monolayer of graphene with very low sheet resistance of 240 Omega/sq could be obtained without sacrificing the optical transmittance (>97.7% at 550 nm wavelength). (C) 2015 Elsevier Ltd. All rights reserved.
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