4.3 Article

Double Gate Double-Channel AlGaN/GaN MOS HEMT and its Applications to LNA with Sub-1 dB Noise Figure

Related references

Note: Only part of the references are listed.
Article Engineering, Electrical & Electronic

Enhancement in Analog/RF and Power Performance of Underlapped Dual-Gate GaN-Based MOSHEMTs with Quaternary InAlGaN Barrier of Varying Widths

Hrit Mukherjee et al.

Summary: Comparing the analog/radiofrequency and power performance of a quaternary InAlGaN MOS-HEMT and a ternary AlGaN MOS-HEMT with the same structure, the former shows superior performance for high-frequency amplifiers. By varying the thickness of the barrier layer, it is found that the thinner-quaternary MOS-HEMT exhibits better performance in sophisticated high-power devices.

JOURNAL OF ELECTRONIC MATERIALS (2022)

Article Chemistry, Physical

RF/Analog and Linearity Performance Evaluation of Lattice-matched Ultra-thin AlGaN/GaN Gate Recessed MOSHEMT with Silicon Substrate

Abdul Naim Khan et al.

Summary: This article demonstrates and analyzes the analog/RF and linearity performances of an AlGaN/GaN gate recessed MOSHEMT grown on a Si substrate using TCAD simulation. The GR-MOSHEMT shows significant improvements in AC/DC figure of merits, such as low leakage current, high transconductance, and excellent linear properties.

SILICON (2022)

Article Engineering, Electrical & Electronic

Digital Performance Assessment of the Dual-Material Gate GaAs/InAs/Ge Junctionless TFET

Mahdi Vadizadeh

Summary: A GaAs/InAs/Ge junctionless tunnel field-effect transistor (JL-TFET) device with a dual-material gate (DMG) structure is proposed in this article, showing improved performance parameters compared to traditional devices and offering potential for significant impact in digital applications.

IEEE TRANSACTIONS ON ELECTRON DEVICES (2021)

Article Physics, Applied

Impact of effective mass changes with mole-fraction on the analog/radio frequency benchmarking parameters in junctionless GaxIn1-xAs/GaAs field-effect transistor

Mahdi Vadizadeh et al.

Summary: This study for the first time takes into account the changes in effective mass of electron and hole with mole fraction in simulation analysis of JL-GaxIn1-xAs/GaAs devices. The results show a decrease in certain performance parameters when considering the changes in effective mass, indicating a limiting effect on device performance. Therefore, the increase in electron effective mass with the increased mole fraction can impact the analog/RF frequency and high-frequency noise performance of the devices.

INTERNATIONAL JOURNAL OF MODERN PHYSICS B (2021)

Article Physics, Condensed Matter

Influence of Graded AlGaN sub-channel over the DC and Breakdown characteristics of a T-gated AlGaN/GaN/AlInN MOS-HEMT

V Sandeep et al.

Summary: The impact of graded Al0.05Ga0.95N sub-channel on the DC characteristics of AlGaN/GaN/AlInN MOS-HEMT was investigated through TCAD simulation, analyzing various device and RF parameters. The results showed that the T-gated structure enhanced the breakdown voltage of the device and the linearity improvement was achieved through the graded AlGaN sub-channel.

SUPERLATTICES AND MICROSTRUCTURES (2021)

Article Nanoscience & Nanotechnology

Impact of channel doping engineering on the high-frequency noise performance of junctionless In0.3Ga0.7As/GaAs FET: A numerical simulation study

Mohammad Fallahnejad et al.

PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES (2020)

Article Engineering, Electrical & Electronic

Impact of AlInN Back-Barrier Over AlGaN/GaN MOS-HEMT With HfO2 Dielectric Using Cubic Spline Interpolation Technique

V. Sandeep et al.

IEEE TRANSACTIONS ON ELECTRON DEVICES (2020)

Article Engineering, Electrical & Electronic

Single and double-gate based AlGaN/GaN MOS-HEMTs for the design of low-noise amplifiers: a comparative study

Deepak Kumar Panda et al.

IET CIRCUITS DEVICES & SYSTEMS (2020)

Article Nanoscience & Nanotechnology

Design and analysis of 10 nm T-gate enhancement-mode MOS-HEMT for high power microwave applications

Ouati Zine-eddine et al.

JOURNAL OF SCIENCE-ADVANCED MATERIALS AND DEVICES (2019)

Article Engineering, Electrical & Electronic

Characteristics of GaAs/GaSb tunnel field-effect transistors without doping junctions: numerical studies

Mahdi Vadizadeh

JOURNAL OF COMPUTATIONAL ELECTRONICS (2018)

Article Telecommunications

Highly Linear High-Frequency Low-Noise Amplifier Design at ISM Band

Farhad Bahadori-Jahromi et al.

WIRELESS PERSONAL COMMUNICATIONS (2018)

Article Physics, Condensed Matter

Performance improvement of junctionless field effect transistors using p-GaAs/AlGaAs heterostructure

E. Bajelan et al.

SUPERLATTICES AND MICROSTRUCTURES (2017)

Article Engineering, Electrical & Electronic

Oxide interfacial charge engineering towards normally-off AlN/GaN MOSHEMT

R. Swain et al.

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING (2016)

Article Physics, Multidisciplinary

Impact of oxide thickness on gate capacitance - Modelling and comparative analysis of GaN-based MOSHEMTs

Kanjalochan Jena et al.

PRAMANA-JOURNAL OF PHYSICS (2015)

Article Engineering, Electrical & Electronic

Analysis of the RF and noise performance of junctionless MOSFETs using Monte Carlo simulation

Yongbo Chen et al.

INTERNATIONAL JOURNAL OF NUMERICAL MODELLING-ELECTRONIC NETWORKS DEVICES AND FIELDS (2014)

Article Physics, Condensed Matter

Composite HfO2/Al2O3-dielectric AlGaAs/InGaAs MOS-HEMTs by using RF sputtering/ozone water oxidation

Ching-Sung Lee et al.

SUPERLATTICES AND MICROSTRUCTURES (2014)

Article Engineering, Electrical & Electronic

GaN-Based Robust Low-Noise Amplifiers

Sergio Colangeli et al.

IEEE TRANSACTIONS ON ELECTRON DEVICES (2013)

Article Engineering, Electrical & Electronic

Compact Charge-Based Physical Models for Current and Capacitances in AlGaN/GaN HEMTs

Fetene Mulugeta Yigletu et al.

IEEE TRANSACTIONS ON ELECTRON DEVICES (2013)

Article Engineering, Electrical & Electronic

InP-HEMT X-band Low-Noise Amplifier With Ultralow 0.6-mW Power Consumption

Liang Liu et al.

IEEE ELECTRON DEVICE LETTERS (2012)

Article Engineering, Electrical & Electronic

AlGaN/GaN Metal-Oxide-Semiconductor High-Electron Mobility Transistor With Liquid-Phase-Deposited Barium-Doped TiO2 as a Gate Dielectric

Chih-Chun Hu et al.

IEEE TRANSACTIONS ON ELECTRON DEVICES (2012)

Article Engineering, Electrical & Electronic

Enhancement-mode Si3N4/AlGaN/GaN MISHFETs

Ruonan Wang et al.

IEEE ELECTRON DEVICE LETTERS (2006)

Article Engineering, Electrical & Electronic

A low-power, X-band SiGe HBT low-noise amplifier for near-space radar applications

Wei-Min Lance Kuo et al.

IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS (2006)

Article Engineering, Electrical & Electronic

High transconductance enhancement-mode AlGaN/GaN HEMTs on SiC substrate

V Kumar et al.

ELECTRONICS LETTERS (2003)

Article Physics, Condensed Matter

Pyroelectric properties of Al(In)GaN/GaN hetero- and quantum well structures

O Ambacher et al.

JOURNAL OF PHYSICS-CONDENSED MATTER (2002)

Article Engineering, Electrical & Electronic

Enhancement mode AlGaN/GaN HFET with selectively grown pn junction gate

X Hu et al.

ELECTRONICS LETTERS (2000)