4.6 Article

Plasma-assisted chemical-looping combustion: Mechanistic insights into low temperature methane oxidation with CuO

Journal

PROCEEDINGS OF THE COMBUSTION INSTITUTE
Volume 39, Issue 4, Pages 5551-5560

Publisher

ELSEVIER SCIENCE INC
DOI: 10.1016/j.proci.2022.07.156

Keywords

Plasma-assisted chemical-looping combustion; Dielectric barrier discharge; Copper oxide; Methane; Fixed-bed flow reactor

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The low-temperature oxidation of methane by CuO using a coaxial, fixed bed, double dielectric barrier discharge (DBD) reactor was investigated. The experiment showed that plasma conditions significantly enhanced fuel oxidation and CO2 production at lower temperatures (≤600°C) compared to non-plasma conditions.
The low-temperature oxidation of CH4 by CuO in a coaxial, fixed bed, double dielectric barrier discharge (DBD) reactor was investigated with time-dependent species measurements by an electron-ionization molec-ular beam mass spectrometer (EI-MBMS). In the experiment, 10% methane carried by noble gasses was flown at 50 sccm through 1 g CuO dispersed in quartz wool both under plasma and non-plasma conditions, while time-dependent gas-phase species profiles were collected. Plasma conditions were explored from 300 to 600 & DEG;C while the non-plasma conditions were set from 300 to 900 & DEG;C. Mechanistic insights into the oxidation of CH4 by CuO with plasma discharge at lower temperatures ( & LE; 600 & DEG;C) were obtained by quantifying the fuel oxidation, intermediate species, and CO2 production in comparison to the non-plasma conditions. We observed significant enhancement of fuel oxidation from the plasma discharge between 400 and 500 & DEG;C. The CO2 production at 500 & DEG;C with plasma was greater than that at 700 & DEG;C without plasma, reducing fuel oxida-tion temperature by 200 + & DEG;C. During tests, three distinct reaction stages were observed: a gas-phase transport limited stage, a surface reaction limited kinetic stage, and an oxygen ion diffusion limited stage. It was ob-served that plasma greatly improved the reactivity of the second stage at low temperature. In addition, no carbon deposits were observed on the resultant particles, even under the presence of plasma. M. species such as C4H2 and C6H6 not previously observed or predicted in CuO/CH4 chemical looping were observed, with some species such as CH3OH only becoming detectable as total flowrate was increased from 50 to 1500sccm. A non-plasma reaction pathway for CH4 based the observed species from the MBMS spectrum and previous predictions from reactive molecular dynamics simulations was created, providing a framework from which future, more complex plasma CuO mechanisms can be crafted from.& COPY; 2022 Published by Elsevier Inc. on behalf of The Combustion Institute.

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