Journal
NANOTECHNOLOGY
Volume 33, Issue 50, Pages -Publisher
IOP Publishing Ltd
DOI: 10.1088/1361-6528/ac8c4a
Keywords
direct laser writing; two photon absorption; copper clusters; common metal
Funding
- National Key Research and Development Program of China [2021YFB2802000]
- Science, Technology and Innovation Commission of Shenzhen Municipality [JCYJ20180507184503128]
- National Natural Science Foundation of China [61775068]
- Creative Research Group Project of NSFC [61821003]
Ask authors/readers for more resources
A one-step method for patterning low-resistivity nanoscale copper wire is proposed, which introduces complexing and reducing agents and controls the laser writing parameters to fabricate common metal nanodevices successfully.
A one-step method for patterning low-resistivity nanoscale copper wire is proposed herein to solve the challenging issues of using common metals rather than noble metal nanostructures fabricated by direct laser writing in solution. A complexing and a reducing agent were introduced for the single-photon absorption of copper solution in the visible range and to enable two-photon absorption with a femtosecond laser. Copper clusters were generated prior to direct laser writing to decrease induced laser energy during two-photon absorption and accelerate copper nanowire patterning to avoid the boiling of copper solution. A surfactant was used to restrain the overgrowth of copper clusters to obtain written nanowires with high uniformity. By controlling the laser writing parameters, the obtained copper wire had a minimum width of 230 nm and a resistivity of 1.22 x 10(-5) Omega.m. Our method paves the way for the fabrication of common metal nanodevices by direct laser writing.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available