Morphological and multifractal properties of Cr thin films deposited onto different substrates

In this study, the morphological properties and micro-roughness of chromium thin film prepared by thermal evaporation technique and confirmed via EDS analysis are examined on different substrates of BK7, Silicon (Si), and glass using atomic force microscope analysis (AFM). Analysis of amplitude parameters, Minkowski functionals, and films' spatial microtexture extracted from AFM analysis showed the difference between glass substrate and the other two (BK7 and Si) substrates for the growth of chromium thin films. In addition, we observed robust signatures of multifractality of the Cr thin films deposited on all substrates we studied. Moreover, we highlight that the Glass substrates displayed the strongest multifractality indicating that such samples present space filling properties distributed over more spatial scales than the samples of BK7 and Si.

Automated summary

In this study, the morphological properties and micro-roughness of chromium thin films were analyzed using atomic force microscope (AFM) on different substrates of BK7, Silicon (Si), and glass, prepared by thermal evaporation technique and confirmed via EDS analysis. The analysis showed differences in the growth of chromium thin films between glass substrate and the other two substrates (BK7 and Si). Multifractality of the Cr thin films deposited on all studied substrates was observed, with glass substrates displaying the strongest multifractality indicating the distribution of space filling properties over more spatial scales compared to BK7 and Si samples.