Kinetics driving nanocomposite thin-film deposition in low-pressure misty plasma processes

Mist-assisted methods have recently attracted much attention for plasma deposition in high-quality (multi)functional thin films. However, very little is known on plasma interactions with misted colloidal solutions and their role in plasma process kinetics. Time-resolved optical diagnostics have been carried out to study the deposition of TiO2-SiO2 nanocomposite thin films in low-pressure oxygen-argon plasmas with organosilicon precursors and TiO2 suspensions. Each pulsed injection of the dispersion was followed by a pressure rise due to solvent evaporation. This caused a significant reduction in the electron temperature and density, which mitigated matrix precursor fragmentation and SiO2 deposition as TiO2 nanoparticles were supplied to the film. Comparing injections with and without nanoparticles, misty plasma effects were dominated by plasma droplets rather than plasma-nanoparticle interactions. Successive matrix-rich and nanoparticle-rich deposition steps were confirmed by in situ spectroscopic ellipsometry.

Automated summary

Mist-assisted methods in plasma deposition of high-quality thin films have recently gained attention, but little is known about plasma interactions with misted colloidal solutions. Time-resolved optical diagnostics were used to study the deposition of TiO2-SiO2 nanocomposite thin films in low-pressure oxygen-argon plasmas. The presence of nanoparticles in misty plasma effects were dominated by plasma droplets, not plasma-nanoparticle interactions. Subsequent matrix-rich and nanoparticle-rich deposition steps were confirmed using in situ spectroscopic ellipsometry.