4.6 Article

Structural and the optical characteristics of PbSx thin films

Journal

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 33, Issue 29, Pages 23270-23281

Publisher

SPRINGER
DOI: 10.1007/s10854-022-09093-w

Keywords

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Funding

  1. Taif University, Taif, Saudi Arabia [TURSP-2020/12]

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In this study, PbSx thin films were prepared using spin coating method, and the structures, microstructures, and optical properties of the films were investigated using various techniques. The experimental results show that the direct band gap transition values of the PbSx films increase with the reduction of sulfur.
PbSx thin films (x = 1, 0.9, 0.8, 0.7, 0.6) were prepared onto glass substrates using spin coating method. The phases developed and vacancies created in the different films were explored employing theta-theta scan X-ray diffraction, grazing incidence X-ray diffraction, and Fourier transform infrared techniques. The possibility of incorporation of oxygen in PbS lattice was also examined using X-ray photoelectron spectroscopy technique. Rietveld analysis was achieved to determine the variation in the structural and microstructural parameters of different films. The morphology and thickness of the films were explored using scanning electron microscope technique. The direct band gap transition values for PbSx films with x = 1, 0.9, 0.7 and 0.6 are 2.63, 2.85, 2.95, and 3.02 eV, respectively. The refractive indices of all films demonstrated a normal dispersion. The effect of sulfur reduction in the formed films on the optical absorbance, reflectance spectra, absorption edge, extinction coefficient, dielectric constant, photoluminescence emitted colors, and nonlinear optical parameters of the PbSx films was investigated.

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