4.7 Article

3D flower-like hollow CuS@PANI microspheres with superb X-band electromagnetic wave absorption

Journal

JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
Volume 126, Issue -, Pages 141-151

Publisher

JOURNAL MATER SCI TECHNOL
DOI: 10.1016/j.jmst.2022.03.016

Keywords

Flower-like hollow CuS@PANI microspheres; Impedance matching; Dielectric loss; EM wave absorption

Funding

  1. PhD Research Startup Foundation of Bohai University [0521bs021]

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In this study, novel 3D flower-like hollow CuS@PANI microspheres were successfully fabricated and their electromagnetic wave absorption properties in the X-band were systematically studied. The microspheres exhibited excellent absorption performance and effective absorption bandwidth due to their outstanding impedance matching characteristics and dielectric loss capability. Furthermore, the distinctive flower-like hollow structure of the microspheres provided an additional wave-absorbing mechanism.
Superior electromagnetic (EM) wave absorption properties in 8.2-12.4 GHz (X-band) can be obtained via the effective combination of polyaniline (PANI) and CuS. Herein, novel 3D flower-like hollow CuS@PANI microspheres were fabricated by a solvothermal process followed by in-situ polymerization. EM wave absorption properties of 3D flower-like hollow CuS@PANI microspheres in X-band were systematically studied, indicating the minimum reflection loss (RLmin) of -71.1 dB and effective absorption bandwidth (EAB) covering 81% of test frequency range were achieved with a thickness of 2.75 mm. Excellent EM wave absorption properties of 3D flower-like hollow CuS@PANI microspheres were mainly ascribed to outstanding impedance matching characteristic and dielectric loss capability (conduction loss, interfacial polarization loss and dipole polarization loss). Moreover, due to the distinctive flower-like hollow structure of CuS@PANI microspheres, an additional wave-absorbing mechanism was provided by increasing the transmission paths of EM waves. (C) 2022 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.

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