4.7 Article

Enhanced photoluminescence of GeSn by strain relaxation and spontaneous carrier confinement through rapid thermal annealing

Related references

Note: Only part of the references are listed.
Article Optics

Electrically injected GeSn lasers with peak wavelength up to 2.7 μm

Yiyin Zhou et al.

Summary: The study focuses on GeSn lasers and explores heterostructure laser diodes with various layer thicknesses and material compositions. The research provides guidance for the design of future GeSn laser diodes towards full integration on a Si platform.

PHOTONICS RESEARCH (2022)

Article Physics, Applied

1D photonic crystal direct bandgap GeSn-on-insulator laser

Hyo-Jun Joo et al.

Summary: GeSn alloys are considered as potential lasing materials, but current GeSn lasers suffer from large device footprints and active areas. Researchers have developed a strain-free nanobeam laser with smaller device footprint and active area, showing lower threshold density and higher operating temperature compared to compressive strained counterparts. This development paves the way for practical group-IV light sources with high-density integration and low power consumption.

APPLIED PHYSICS LETTERS (2021)

Article Crystallography

Highly strained Ge1-xSnx alloy films with high Sn compositions grown by MBE

Lian Wei et al.

Summary: The study found that Ge1-xSnx alloy films are highly strained even after Sn segregation, and increasing the Sn composition shrinks the bandgap of Ge1-xSnx. Low growth temperatures and high growth rates are beneficial for achieving higher Sn compositions, while strain plays an important role in limiting Sn incorporation.

JOURNAL OF CRYSTAL GROWTH (2021)

Article Physics, Applied

Composition uniformity and large degree of strain relaxation in MBE-grown thick GeSn epitaxial layers, containing 16% Sn

Jaswant Rathore et al.

Summary: In this study, the researchers systematically investigated the compositional uniformity, strain relaxation, defect structure, and surface morphology of GeSn epitaxial layers grown on Ge-buffered Si substrates. They found that a high degree of strain relaxation and compositional uniformity can be achieved in layers with high-Sn content, with differences in defect structure compared to chemical vapor deposition growth of the alloy. The results suggest promising prospects for future improvements in mid-infrared photonic device design and fabrication.

JOURNAL OF PHYSICS D-APPLIED PHYSICS (2021)

Article Optics

GeSnOI mid-infrared laser technology

Binbin Wang et al.

Summary: GeSn alloys are promising materials for manufacturing CMOS-compatible mid-infrared lasers, with the potential to transform into direct bandgap semiconductors through Sn alloying and tensile strain. However, current laser technology faces limitations such as poor optical confinement and lack of strain, thermal, and defects management. The GeSnOI approach demonstrates potential for integrating planar Group-IV semiconductor lasers on a versatile photonic platform, offering improved optical gain and vertical out-coupling efficiency for mid-infrared photonics development.

LIGHT-SCIENCE & APPLICATIONS (2021)

Article Physics, Applied

Growth of relaxed GeSn film with high Sn content via Sn component-grade buffer layer structure

Xiangquan Liu et al.

Summary: Relaxed GeSn films with a high Sn content were successfully grown on Ge (100) substrates using a component-grade buffer layer structure. The films exhibited high strain relaxation, low threading dislocation density, and atomic surface flatness. Additionally, the thermal stability of the GeSn samples was improved.

JOURNAL OF PHYSICS D-APPLIED PHYSICS (2021)

Article Crystallography

Impact of Long-Term Annealing on Photoluminescence from Ge1-xSnx Alloys

Oluwatobi Olorunsola et al.

Summary: This study explores the correlation between strain, composition, defect density, and photoluminescence in GeSn samples with Sn content between 8% to 10%, before and after annealing at 300 degrees C. The results demonstrate how annealing affects strain levels, energy separations between optical transitions, and the density of dislocations and surface roughness. Annealing is observed to decrease the energy separation between indirect and direct optical transitions, leading to an increase in photoluminescence, while also increasing the density of dislocations and surface roughness, resulting in a decrease in photoluminescence intensity.

CRYSTALS (2021)

Article Engineering, Electrical & Electronic

Effects of Annealing on the Behavior of Sn in GeSn Alloy and GeSn-Based Photodetectors

Liming Wang et al.

IEEE TRANSACTIONS ON ELECTRON DEVICES (2020)

Article Materials Science, Multidisciplinary

Growth mode control for direct-gap core/shell Ge/GeSn nanowire light emission

Andrew C. Meng et al.

MATERIALS TODAY (2020)

Article Engineering, Electrical & Electronic

Strain evolution in SiGe-on-insulator fabricated by a modified germanium condensation technique with gradually reduced condensation temperature

Guangyang Lin et al.

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING (2019)

Article Nanoscience & Nanotechnology

Si-Based GeSn Photodetectors toward Mid-Infrared Imaging Applications

Huong Tran et al.

ACS PHOTONICS (2019)

Article Physics, Applied

Enhanced Sn incorporation in GeSn epitaxial semiconductors via strain relaxation

S. Assali et al.

JOURNAL OF APPLIED PHYSICS (2019)

Article Crystallography

GeSn growth kinetics in reduced pressure chemical vapor deposition from Ge2H6 and SnCl4

J. Aubin et al.

JOURNAL OF CRYSTAL GROWTH (2018)

Article Nanoscience & Nanotechnology

The thermal stability of epitaxial GeSn layers

P. Zaumseil et al.

APL MATERIALS (2018)

Article Engineering, Electrical & Electronic

Band gap and strain engineering of pseudomorphic Ge1-x-ySixSny alloys on Ge and GaAs for photonic applications

Nalin S. Fernando et al.

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2018)

Article Multidisciplinary Sciences

Free-running Sn precipitates: an efficient phase separation mechanism for metastable Ge1-xSnx epilayers

Heiko Groiss et al.

SCIENTIFIC REPORTS (2017)

Article Physics, Applied

Optically pumped GeSn micro-disks with 16% Sn lasing at 3.1 μm up to 180K

V. Reboud et al.

APPLIED PHYSICS LETTERS (2017)

Article Engineering, Electrical & Electronic

Properties of pseudomorphic and relaxed germanium1-xtinx alloys (x < 0.185) grown by MBE

Ryan Hickey et al.

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2017)

Article Physics, Applied

GeSn p-i-n photodetectors with GeSn layer grown by magnetron sputtering epitaxy

Jun Zheng et al.

APPLIED PHYSICS LETTERS (2016)

Review Crystallography

Si-Ge-Sn alloys: From growth to applications

S. Wirths et al.

PROGRESS IN CRYSTAL GROWTH AND CHARACTERIZATION OF MATERIALS (2016)

Article Physics, Applied

Electroluminescence from GeSn heterostructure pin diodes at the indirect to direct transition

J. D. Gallagher et al.

APPLIED PHYSICS LETTERS (2015)

Article Chemistry, Physical

Direct Bandgap Group IV Epitaxy on Si for Laser Applications

N. von den Driesch et al.

CHEMISTRY OF MATERIALS (2015)

Article Optics

Lasing in direct-bandgap GeSn alloy grown on Si

S. Wirths et al.

NATURE PHOTONICS (2015)

Article Physics, Applied

Direct-bandgap GeSn grown on silicon with 2230 nm photoluminescence

Seyed Amir Ghetmiri et al.

APPLIED PHYSICS LETTERS (2014)

Article Physics, Applied

Competition of optical transitions between direct and indirect bandgaps in Ge1-xSnx

Wei Du et al.

APPLIED PHYSICS LETTERS (2014)

Article Materials Science, Multidisciplinary

Epitaxial growth of strained and unstrained GeSn alloys up to 25% Sn

Michael Oehme et al.

THIN SOLID FILMS (2014)

Article Physics, Applied

Lattice constant and substitutional composition of GeSn alloys grown by molecular beam epitaxy

Nupur Bhargava et al.

APPLIED PHYSICS LETTERS (2013)

Article Physics, Applied

Strain relaxation and Sn segregation in GeSn epilayers under thermal treatment

H. Li et al.

APPLIED PHYSICS LETTERS (2013)

Article Physics, Applied

Achieving direct band gap in germanium through integration of Sn alloying and external strain

Suyog Gupta et al.

JOURNAL OF APPLIED PHYSICS (2013)

Article Materials Science, Multidisciplinary

Relaxed and Strained Patterned Germanium-Tin Structures: A Raman Scattering Study

Ran Cheng et al.

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2013)

Article Physics, Applied

GeSn p-i-n detectors integrated on Si with up to 4% Sn

M. Oehme et al.

APPLIED PHYSICS LETTERS (2012)

Article Engineering, Electrical & Electronic

Germanium-Tin n+/p Junction Formed Using Phosphorus Ion Implant and 400 °C Rapid Thermal Anneal

Lanxiang Wang et al.

IEEE ELECTRON DEVICE LETTERS (2012)