Journal
INTERNATIONAL JOURNAL OF MECHANICAL SCIENCES
Volume 230, Issue -, Pages -Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.ijmecsci.2022.107559
Keywords
CMP; Modeling; Contact status; Polishing pad; Material removal rate
Categories
Funding
- National Natural Science Foundation of China [51991373, 51875078, 51475076]
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The micro-scale contact status between the pad and the workpiece surface is crucial in determining the material removal rate during the CMP process. This paper introduces the concept of effective contact spots to evaluate the contribution of random contact status to the material removal process. Mechanical removal capacity and chemical reaction capacity parameters are defined to mathematically model the material removal process from a micro-scale chemical-mechanical synergistic perspective. Experimental observations and theoretical analysis confirm the importance of the micro-scale contact status and the dominant roles of the real contact ratio, radius, and spacing in determining the material removal rate for different materials.
The micro-scale contact status between pad and workpiece surface plays one of the most significant roles in determining the material removal rate (MRR) during the chemical mechanical polishing (CMP) process. To evaluate the contribution of random contact status to the material removal process, the paper proposed a novel concept of effective contact spots. It represents the probability of randomly distributed pad asperities sliding across a given coordinate point on the workpiece surface. Furthermore, mechanical removal capacity parameter gamma and chemical reaction capacity parameter beta were defined to mathematically model the material removal process from a micro-scale chemical-mechanical synergistic perspective. To validate the model, a series of CMP tests (with in-situ conditioning) were conducted on three types of materials (BK7 glass, fused silica, and Si). The real contact status was also measured and analyzed statistically after being conditioned with two types of conditioners. Experimental observations and theoretical analysis results indicated that the chemical-mechanical synergism was the fundamental mechanism for the contribution of the micro-scale contact status to the material removal process. Resulting in the fact that the real contact ratio, radius, and spacing of the real contact spots play different dominant roles on MRR for different materials. Moreover, solution strategies in this study can provide the knowledge needed for improving the material removal stability, and further enable predictive control on the polishing or conditioning recipe before a non-ideal contact status result in an unexpected material removal rate.
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