4.7 Article

Shallow Impurity States in Doped Silicon Substrates Enabling High Responsivity for Graphene Mid-Infrared Photodetectors

Journal

ACS APPLIED NANO MATERIALS
Volume 5, Issue 9, Pages 12477-12486

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsanm.2c02011

Keywords

shallow impurity states; mid-infrared photodetectors; photogating effect; doped silicon; nanostructures; graphene

Funding

  1. Earth Science Technology Office (ESTO), NASA

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The practical realization of optoelectronic devices operating in the mid-infrared region is hindered by barriers such as cryogenic operation and complicated growth processes, prompting the interest in extending the performance of graphene photodetectors into this region. By utilizing photoionization of shallow impurities and over band gap excitation in highly doped Si:B and Si:P substrates, researchers have achieved pure graphene photodetectors operating in a broadband range from deep ultraviolet to mid-infrared, with a photoresponsivity of about 5 A/W under mid-infrared illumination at room temperature. This paves the way for a concept of dual-photogating effect induced by both highly doped Si substrates and nanomaterials/nanostructures on top of graphene field-effect transistors.
The practical realization of optoelectronic devices operating in the mid-infrared region is stimulated by both fundamental interests and applications ranging from spectroscopy, sensing, imaging, and security to communications. Despite significant achievements in semiconductors, essential barriers including the cryogenic operation and complicated growth processes prevent the applications of mid-infrared detectors. Graphene is widely used in modern electronics, but its low absorption limits photo-detection. It is therefore of interest to extend the performance of graphene photodetectors into the mid-infrared region. Here, we first demonstrate pure graphene photodetectors operating in a broadband range from the deep ultraviolet to the mid-infrared region by utilizing photoionization of shallow impurities and over band gap excitation in highly doped Si:B and Si:P substrates. We have observed a photoresponsivity of similar to 5 A/W under the mid-infrared illumination at room temperature. This approach paves the way for a concept of dual-photogating effect induced by both highly doped Si substrates and nanomaterials/nanostructures on top of graphene field-effect transistors.

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