4.8 Article

Improving carrier mobility in two-dimensional semiconductors with rippled materials

Journal

NATURE ELECTRONICS
Volume 5, Issue 8, Pages 489-496

Publisher

NATURE PORTFOLIO
DOI: 10.1038/s41928-022-00777-z

Keywords

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Funding

  1. SERC Central Research Fund [CRF KIMR211001kSERCRF]
  2. Advanced Manufacturing and Engineering Young Individual Research Grant (AME YIRG grant) [A2084c170]
  3. National Research Foundation Competitive Research Programs [NRFCRP24-2020-0002]
  4. Hong Kong Polytechnic University [1-BE47, ZE0C, ZE2F, ZE2X]
  5. Accelerated Materials Development for Manufacturing Program at the Agency for Science, Technology and Research (A*STAR) via the AME Programmatic Fund [A1898b0043]
  6. National Natural Science Foundation (NSF) of China [62104041]
  7. Shanghai Sailing Program [21YF1402600]
  8. NSF of Shanghai [22ZR1405700]

Ask authors/readers for more resources

Lattice distortions induced by ripples can reduce phonon scattering and improve charge carrier mobility in 2D materials, leading to high-performance transistors and thermoelectric devices.
Lattice distortions induced by ripples in two-dimensional molybdenum disulfide can reduce electron-phonon scattering, leading to improved charge carrier mobility and enhanced transistor performance. Two-dimensional (2D) semiconductors could potentially replace silicon in future electronic devices. However, the low carrier mobility in 2D semiconductors at room temperature, caused by strong phonon scattering, remains a critical challenge. Here we show that lattice distortions can reduce electron-phonon scattering in 2D materials and thus improve the charge carrier mobility. We introduce lattice distortions into 2D molybdenum disulfide (MoS2) using bulged substrates, which create ripples in the 2D material leading to a change in the dielectric constant and a suppressed phonon scattering. A two orders of magnitude enhancement in room-temperature mobility is observed in rippled MoS2, reaching similar to 900 cm(2) V-1 s(-1), which exceeds the predicted phonon-limited mobility of flat MoS2 of 200-410 cm(2) V-1 s(-1). We show that our approach can be used to create high-performance room-temperature field-effect transistors and thermoelectric devices.

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