4.6 Article

Achievement of Unidirectional Aluminum Tin Oxide/UV-Curable Polymer Hybrid Film via UV Nanoimprinting Lithography for Uniform Liquid Crystal Alignment

Journal

CRYSTALS
Volume 12, Issue 6, Pages -

Publisher

MDPI
DOI: 10.3390/cryst12060855

Keywords

UV nanoimprint lithography; aluminum tin oxide; unidirectional nanostructure; liquid crystal; alignment layer

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A uniform unidirectional nanostructure composed of aluminum tin oxide and ultraviolet (UV)-curable polymer was fabricated using UV-nanoimprint lithography (UV-NIL) and used as a liquid crystal alignment layer. The well-ordered nanostructure with a periodicity of 760 nm and height of 30 nm was confirmed by atomic force microscopy and line profile analysis. The compatibility of the nanopatterned hybrid film for LC device application was demonstrated through optical transmittance investigation.
A uniform unidirectional nanostructure composed of aluminum tin oxide and ultraviolet (UV)-curable polymer is introduced herein. The nanostructure was produced by UV-nanoimprint lithography (UV-NIL), and the fabricated hybrid film was used as a uniform liquid crystal (LC) alignment layer. Atomic force microscopy and line profile analysis were performed to confirm a well-ordered nanostructure with 760 nm periodicity and 30 nm height. X-ray photoelectron spectroscopy analysis was also conducted to examine the chemical modifications to the hybrid film surface during UV exposure. Optical transmittance investigation of the nanopatterned hybrid film revealed its compatibility for LC device application. Stable, uniform, and homogeneous LC alignment on the hybrid film was confirmed by polarized optical microscopy observance and analysis of LC pretilt angle. The unidirectional structure on the film surface enabled uniform LC orientation along with surface anisotropy property. Hence, we expect that the proposed UV-NIL process can be applied to fabricate high-resolution unidirectional nanostructures with various inorganic/organic hybrid materials and that these nanostructures have high potential for next-generation LC systems.

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