Journal
ADVANCED ELECTRONIC MATERIALS
Volume 8, Issue 11, Pages -Publisher
WILEY
DOI: 10.1002/aelm.202200089
Keywords
CuI; electrochemical metallization (ECM) memristors; logic-in computing; solution processes
Funding
- Ministry of Education (MOE), Singapore [R-263-000-E81-114, R-263-000-E10-112]
- China Scholarship Council (CSC) [202006990063]
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A novel electrochemical metallization memristor based on solution-processed Pt/CuI/Cu structure is proposed and demonstrated in this work. It has high resistance switching ratio and low power consumption, enabling Boolean logic operations and image encryption and decryption.
Memristors are intensively studied as being regarded as the critical components to realize the in-memory computing paradigm. A novel electrochemical metallization memristor based on solution-processed Pt/CuI/Cu structure is proposed and demonstrated in this work, with a high resistance switching ratio of 1.53 x 10(7). Owing to the efficient drift paths provided by Cu vacancies for Cu cations in CuI, very small operating voltages (V-set = 0.64 V and V-reset = -0.19 V) are characterized, contributing to ultralow standby power consumption of 9 fW and per set transition of 8.73 mu W. Using CuI memristor arrays, a set of Boolean logic operations and a half-adder are implemented. Moreover, by building the model for a 75 x 48 one-transistor-one-memristor array, the feasibility of hardware encryption and decryption for images is verified. All these demonstrate that solution-processed CuI memristors possess great potential in constructing energy-efficient logic-in-memory computing architectures.
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