4.7 Article

Unraveling the Role of Polydopamines in Resistive Switching in Al/Polydopamine/Al Structure for Organic Resistive Random-Access Memory

Journal

POLYMERS
Volume 14, Issue 15, Pages -

Publisher

MDPI
DOI: 10.3390/polym14152995

Keywords

organic resistance random-access memory; polydopamine; resistive switching; oxygen vacancy

Funding

  1. Basic Science Research Programthrough the National Research Foundation of Korea (NRF) [2018R1A6A1A03025708]
  2. National R&D Program through the National Research Foundation of Korea (NRF) - Ministry of Science and ICT [2020M3H2A1076786]
  3. National Research Foundation of Korea (NRF) - Korea government (MSIT) [NRF-2021R1C1C1014004]

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In an era of rapidly evolving artificial intelligence and 5G communications technologies, resistive random-access memory (RRAM) devices are being considered as next generation in-memory computing devices for wearable devices. This study investigates the influence of a polydopamine (PDA) layer on resistive switching in an aluminum/PDA/aluminum structure. The resistance-switching characteristics are analyzed, including the presence of an Al2O3 layer and changes in oxygen vacancies according to PDA coating time.
In an era of rapidly evolving artificial intelligence and 5G communications technologies, massive data storage and processing are required for the real-time operation of digital processors in conventional wearable devices. However, classical von-Neumann architecture computers are limited by bottleneck-related issues. As a solution, resistive random-access memory (RRAM) devices are being considered as next generation in-memory computing devices. Among various materials, a polydopamine (PDA) is an attractive candidate for the fabrication of wearable and flexible RRAM devices. Herein, an aluminum/PDA/aluminum structure is proposed to investigate the influence of the PDA layer on resistive switching. The resistance-switching characteristics of an Al/PDA/Al structure are investigated by changing the PDA's coating time and an on/off ratio of 2.48 x 10(3) is recorded. X-ray photoelectron spectroscopy reveals the presence of an Al2O3 layer in Al/PDA/Al structure, and the contents of oxygen vacancies are changed according to PDA coating time. Conductive filaments in the PDA/Al structure are confirmed by conductive atomic-force microscopy. As an application, a flexible Al/PDA/Al structure is fabricated using polyethylene terephthalate substrate and its operation is successfully confirmed. These results describe the resistive-switching characteristics, including oxygen vacancies, of Al/PDA/Al structures and provide new ways of understanding the resistive-switching mechanism of PDA-based RRAM devices.

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