Arc energy minimization in high-power impulse magnetron sputtering

High-power impulse magnetron sputtering (HiPIMS) is rather a new and rapidly developing method for physical vapor deposition of thin films. Due to a high ionization degree of the sputtered material, the HiPIMS coatings have better properties than those produced by conventional DC magnetron sputtering (DCMS) and mid-frequency magnetron sputtering (MFMS). Along with its advantages, HiPIMS has some disadvantages, which make difficult its application. HiPIMS is characterized by the high pulsed discharge current, which provides higher arc frequency and energy than in MFMS and DCMS. This leads to larger defect size and quantity that appear in the coating obtained. This paper proposes the analytical simulation model to describe the discharge current and discharge voltage during arcing. This model helps to calculate the arc energy, lifetime, and maximum current. It also identifies what parameters of the power supply exert the highest effect on the arc parameters. The paper considers the types of the HiPIMS power supply and compares them with the view of arc quenching effectiveness. The model adequacy is verified by the experimental results of measurement the arc parameters in HiPIMS. It is shown the effect of arc energy on the size and number of defects in the carbon coatings obtained in HiPIMS.

Automated summary

High-power impulse magnetron sputtering (HiPIMS) is a new and rapidly developing method for physical vapor deposition of thin films. Compared to conventional DC magnetron sputtering (DCMS) and mid-frequency magnetron sputtering (MFMS), HiPIMS coatings show better properties. However, HiPIMS has some drawbacks that make its application challenging. This paper proposes an analytical simulation model to describe the discharge current and voltage during arcing in HiPIMS. It also compares different types of HiPIMS power supplies and investigates the effect of arc energy on the defects in the obtained coatings.