4.8 Article

Versatile Surface Patterning with Low Molecular Weight Photoswitches

Journal

SMALL
Volume 18, Issue 37, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.202203245

Keywords

etch resists; imprint lithography; molecular photoswitches; plasmonic materials; surface patterning

Funding

  1. Deutsche Forschungsgemeinschaft [DFG SFB 1459, 433682494]
  2. Projekt DEAL

Ask authors/readers for more resources

This article presents a method for imprint lithography using low molecular weight arylazoisoxazoles photoswitches, which can exhibit rapid and reversible solid-to-liquid phase transition at room temperature, making them suitable for reversible surface functionalization.
Surface patterning of functional materials is a key technology in various fields such as microelectronics, optics, and photonics. In micro- and nanofabrication, polymers are frequently employed either as photoreactive or thermoresponsive resists that enable further fabrication steps, or as functional adlayers in electronic and optical devices. In this article, a method is presented for imprint lithography using low molecular weight arylazoisoxazoles photoswitches instead of polymer resists. These photoswitches exhibit a rapid and reversible solid-to-liquid phase transition upon photo-isomerization at room temperature, making them highly suitable for reversible surface functionalization at ambient conditions. Beyond photo-induced imprint lithography with multiple write-and-erase cycles, prospective applications as patterned matrix for nanoparticles and etch resist on gold surfaces are demonstrated.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.8
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available