Journal
SMALL
Volume 18, Issue 37, Pages -Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.202203245
Keywords
etch resists; imprint lithography; molecular photoswitches; plasmonic materials; surface patterning
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Funding
- Deutsche Forschungsgemeinschaft [DFG SFB 1459, 433682494]
- Projekt DEAL
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This article presents a method for imprint lithography using low molecular weight arylazoisoxazoles photoswitches, which can exhibit rapid and reversible solid-to-liquid phase transition at room temperature, making them suitable for reversible surface functionalization.
Surface patterning of functional materials is a key technology in various fields such as microelectronics, optics, and photonics. In micro- and nanofabrication, polymers are frequently employed either as photoreactive or thermoresponsive resists that enable further fabrication steps, or as functional adlayers in electronic and optical devices. In this article, a method is presented for imprint lithography using low molecular weight arylazoisoxazoles photoswitches instead of polymer resists. These photoswitches exhibit a rapid and reversible solid-to-liquid phase transition upon photo-isomerization at room temperature, making them highly suitable for reversible surface functionalization at ambient conditions. Beyond photo-induced imprint lithography with multiple write-and-erase cycles, prospective applications as patterned matrix for nanoparticles and etch resist on gold surfaces are demonstrated.
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