Journal
OPTICS LETTERS
Volume 47, Issue 13, Pages 3287-3290Publisher
Optica Publishing Group
DOI: 10.1364/OL.459457
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This Letter presents an optimization model for nonlinear Stokes-Mueller polarimetry (SMP) to improve the precision in estimating the nonlinear Mueller matrix (MM) for two- and three-photon processes. A new measurement strategy is designed based on the model and its solution, which significantly reduces the estimation variance and improves the measurement precision of nonlinear polarimeters for second- and third-harmonic generation processes.
In this Letter, we present an optimization model for nonlinear Stokes-Mueller polarimetry (SMP) to improve the precision in estimating the nonlinear Mueller matrix (MM) for two- and three-photon processes. Although nonlinear polarimeters can measure the polarization properties of multi-photon processes or materials, existing methods are suboptimal, leading to low measurement precision. Based on the model and its solution, we have designed a new measurement strategy to substantially reduce the estimation variance of nonlinear MM coefficients by approximately 58.2% for second-harmonic generation polarimetry and 78.7% for third-harmonic generation polarimetry. The model and measurement method can be directly applied to multiphoton processes to improve the precision of SMP. (C) 2022 Optica Publishing Group
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