Direct patterning of colloidal quantum dots with adaptable dual-ligand surface

Colloidal quantum dots (QDs) stand at the forefront of a variety of photonic applications given their narrow spectral bandwidth and near-unity luminescence efficiency. However, integrating luminescent QD films into photonic devices without compromising their optical or transport characteristics remains challenging. Here we devise a dual-ligand passivation system comprising photocrosslinkable ligands and dispersing ligands to enable QDs to be universally compatible with solution-based patterning techniques. The successful control over the structure of both ligands allows the direct patterning of dual-ligand QDs on various substrates using commercialized photolithography (i-line) or inkjet printing systems at a resolution up to 15,000 pixels per inch without compromising the optical properties of the QDs or the optoelectronic performance of the device. We demonstrate the capabilities of our approach for QD-LED applications. Our approach offers a versatile way of creating various structures of luminescent QDs in a cost-effective and non-destructive manner, and could be implemented in nearly all commercial photonics applications where QDs are used. A dual-ligand passivation system comprising photocrosslinkable ligands and dispersing ligands enables quantum dots to be universally compatible with solution-based patterning techniques.

Automated summary

A dual-ligand passivation system enables quantum dots to be universally compatible with solution-based patterning techniques, allowing for the integration of luminescent quantum dot films into photonic devices. This approach offers high resolution, non-destructive patterning, and cost-effectiveness, and can be applied to various commercial photonics applications.