4.5 Article

Atmospheric pressure plasma functionalization of polystyrene

Journal

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 40, Issue 4, Pages -

Publisher

A V S AMER INST PHYSICS
DOI: 10.1116/6.0001850

Keywords

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Funding

  1. Agilent Technologies
  2. U. S. Department of Energy, Office of Science, Office of Fusion Energy Sciences [DE-SC0020232]
  3. National Science Foundation [PHY-1902878, IIP-1747739]

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This paper discusses the results of atmospheric pressure plasma jets functionalizing polystyrene surfaces with oxygen, focusing on the impact of plasma exposure on the surface properties and functionalization mechanisms.
Atmospheric pressure plasma jets (APPJs) are used to improve the adhesive and hydrophilic properties of commodity hydrocarbon polymers such as polypropylene, polyethylene, and polystyrene (PS). These improvements largely result from adding oxygen functional groups to the surface. PS functionalization is of interest to produce high value biocompatible well-plates and dishes, which require precise control over surface properties. In this paper, we discuss results from a computational investigation of APPJ functionalization of PS surfaces using He/O-2/H2O gas mixtures. A newly developed surface reaction mechanism for functionalization of PS upon exposure to these plasmas is discussed. A global plasma model operated in plug-flow mode was used to predict plasma-produced species fluxes onto the PS surface. A surface site balance model was used to predict oxygen-functionalization of the PS following exposure to the plasma and ambient air. We found that O-occupancy on the surface strongly correlates with the O-atom flux to the PS, with alcohol groups and cross-linked products making the largest contributors to total oxygen fraction. Free radical sites, such as alkoxy and peroxy, are quickly consumed in the post-plasma exposure to air through passivation and cross-linking. O-atom fluences approaching 10(17) cm(-2) saturate the O-occupancy on the PS surface, creating functionality that is not particularly sensitive to moderate changes in operating conditions.& nbsp;Published under an exclusive license by the AVS.

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