4.6 Article

A comparative study of the ZnO Fibers-based photodetectors on n-Si and p-Si

Journal

JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 55, Issue 39, Pages -

Publisher

IOP Publishing Ltd
DOI: 10.1088/1361-6463/ac7f04

Keywords

ZnO fibers; electrospinning; ZnO Fs; Si photodetector; self-powered photodetector; ON; OFF ratio

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The ZnO fibers/p-Si and ZnO fibers/n-Si photodetector heterojunctions were fabricated and studied. Both devices exhibited good rectifying characteristics and high rectifying ratio in the dark. Among them, the D1 device showed self-driven characteristics and higher stability, maintaining excellent sensitivity and stability even after 20 days. The D3 device demonstrated good response to 365 nm and 395 nm UV light.
The ZnO fibers (Fs)/p-Si (labeled D1) and ZnO Fs/n-Si (labeled D2) photodetector heterojunctions were fabricated and both devices gave a clear rectifying I-V characteristic with a high rectifying ratio, in the dark. At zero bias, D1 showed self-driven characteristics, while D2 had not and D1 was found to be more stable than D2 in time-dependent measurements. Optoelectronics results revealed that D1 had high sensitivity to both visible and excellent stability after 20 days. At zero bias, the ON/OFF ratio of the D1 photodetector was as high as 33 650 and in the dark, a rectification ratio of 67 400 within +/- 2 V was obtained for the D1 device. The maximum responsivities of the devices was similar to 0.8 mA W-1, and their detectivity was similar to 10(9) Jones. Furthermore, the ZnO Fs/p-Si (labeled D3) and ZnO Fs/n-Si (labeled D3) photodetectors yielded excellent response to 365 nm and 395 nm UV light (10 mW cm(-2)). Responsivity, detectivity (D), and external quantum efficiency values reached as high as 5.28 A W-1, 1.02 x 10(13) Jones, and %16.6, respectively under 365 nm UV light. The excellent responses of the photodetectors to visible and UV light were attributed to the oxygen vacancies in ZnO and the formation of electron-hole pairs by the light effect and their separation by the electric field in the device formed between ZnO and Si.

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