4.8 Article

High-Performance Resistive Random Access Memories Based on Two-Dimensional HAPbI4 Organic-Inorganic Hybrid Perovskite

Journal

JOURNAL OF PHYSICAL CHEMISTRY LETTERS
Volume 13, Issue 33, Pages 7653-7659

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.jpclett.2c01786

Keywords

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Funding

  1. Fundamental Research Funds for the National Key Research and Development Program of China [2018YFB2200500]
  2. National Natural Science Foundation of China [61975023, 51775070, 22072010, 61875211]
  3. Guangdong Province International Scientific and Technological Cooperation Projects [2020A0505100011]
  4. Chinese Academy of Sciences (CAS) Interdisciplinary Innovation Team
  5. Open Fund of the State Key Laboratory of High Field Laser Physics (Shanghai Institute of Optics and Fine Mechanics)
  6. Opening Project of State Key Laboratory of Advanced Technology [2021-KF-19]
  7. Natural Science Foundation of Chongqing [cstc2021ycjh-bgzxm0181]
  8. Science and Technology Research Program of Chongqing Municipal Education Commission [KJZD-K202100601]

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In this study, a two-dimensional HAPbI4 perovskite with high stability was prepared and used to fabricate a resistive random access memory (RRAM) device with superior resistive switching performance, high on/off ratio, long retention time, and stability after prolonged exposure to air.
Organic-inorganic hybrid perovskites have attracted extensive attention for potential memory applications because of their excellent properties, such as high charge carrier mobility and fast ion migration. Herein, the two-dimensional HAPbI4 perovskite with an octahedral structure and high stability was prepared by a facile solution method. Moreover, the resistive random access memory (RRAM) with the Ag/PMMA/HAPbI4/ITO structure has been successfully fabricated by spin coating and vacuum thermal evaporation. The as-prepared RRAM device based on HAPbI4 demonstrated superior resistive switching performance. The on/off ratio is as high as 105, and the corresponding retention of the device exceeds 10 000 s; furthermore, the RRAM device could be kept stable after being kept in the air for 24 weeks.

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