Journal
CRYSTALS
Volume 12, Issue 5, Pages -Publisher
MDPI
DOI: 10.3390/cryst12050721
Keywords
red micro-light-emitting diodes; strain relaxed template; III-nitride
Funding
- Solid-State Lighting and Energy Electronics Center (SSLEEC) at the University of California, Santa Barbara (UCSB)
- Defense Advanced Research Project (DARPA), U.S. Department of Defense [HR00120C0135]
- U.S. DOE EERE [DE-EE0009691]
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This study demonstrates III-nitride red micro-light-emitting diodes (μLEDs) with ultralow forward voltage on a strain relaxed template. The μLEDs emit light at different wavelengths due to the screening of the internal electric field in the quantum wells. However, the maximum external quantum efficiency and wall-plug efficiency of the μLEDs are relatively low, suggesting the need for further material optimization.
In this study, III-nitride red micro-light-emitting diodes (mu LEDs) with ultralow forward voltage are demonstrated on a strain relaxed template. The forward voltage ranges between 2.00 V and 2.05 V at 20 A/cm(2) for device dimensions from 5 x 5 to 100 x 100 mu m(2). The mu LEDs emit at 692 nm at 5 A/cm(2) and 637 nm at 100 A/cm(2), corresponding to a blueshift of 55 nm due to the screening of the internal electric field in the quantum wells. The maximum external quantum efficiency and wall-plug efficiency of mu LEDs are 0.31% and 0.21%, respectively. This suggests that efficient III-nitride red mu LEDs can be realized with further material optimizations.
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