4.6 Article

2D Heterostructure of Bi2O2Se/Bi2SeOx Nanosheet for Resistive Random Access Memory

Journal

ADVANCED ELECTRONIC MATERIALS
Volume 8, Issue 9, Pages -

Publisher

WILEY
DOI: 10.1002/aelm.202200126

Keywords

2D heterostructure; chemical vapor deposition; oxygen plasma; resistive switching

Funding

  1. National Natural Science Foundation of China [12025503, U1867215, U1932134, 12074293]
  2. Hubei Provincial Natural Science Foundation [2019CFA036, 2021CFB477]
  3. Fundamental Research Funds for the Center Universities [2042021kf0066]

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This study explores the application potential of 2D material Bi2O2Se in RRAM, demonstrating the growth of Bi2O2Se nanosheets using CVD and the realization of a 2D heterostructure of Bi2O2Se/Bi2SeOx. The heterostructure shows significant resistive switching behavior, achieved through oxygen plasma treatment of the Bi2O2Se nanosheets.
2D materials have shown great potential in the application of resistive random access memory (RRAM) for information storage. Much attention has been attracted from 2D semiconducting bismuth oxyselenide (Bi2O2Se) for excellent properties in multi-performance nanoelectronics. By using a chemical vapor deposition (CVD) method, Bi2O2Se nanosheets with high quality are grown. Combining with the oxygen plasma method, 2D heterostructure of Bi2O2Se/Bi2SeOx nanosheet is realized; and the heterostructure exhibits obvious resistive switching behavior. The resistive switching mechanism is analyzed in detail, and the conductive mechanism of the fabricated device is also discussed. The resistive switching of Bi2O2Se nanosheets is endowed through the method of O-2 plasma treatment, which makes it feasible for developing its application in the RRAM.

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