4.7 Article

Ultrafast Laser Material Damage Simulation-A New Look at an Old Problem

Journal

NANOMATERIALS
Volume 12, Issue 8, Pages -

Publisher

MDPI
DOI: 10.3390/nano12081259

Keywords

laser-plasma interaction; femtosecond laser; numerical; dielectric thin films

Funding

  1. DOE STTR [DE-SC0019900]
  2. U.S. Department of Energy (DOE) [DE-SC0019900] Funding Source: U.S. Department of Energy (DOE)

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The chirped pulse amplification technique allows for the generation of ultra-short duration pulses with high peak powers. However, the damage of coatings in laser systems limits the further improvement of pulse duration, energy, and repetition rate. In this study, a numerical approach based on strong field electronic dynamics is proposed to estimate the laser induced damage threshold (LID) of dielectric multilayer coatings. The method is applied to simulate the LID threshold of different materials and compared with experimental measurements.
The chirped pulse amplification technique has enabled the generation of pulses of a few femtosecond duration with peak powers multi-Tera and Peta-Watt in the near infrared. Its implementation to realize even shorter pulse duration, higher energy, and higher repetition rate laser systems relies on overcoming the limitations imposed by laser damage of critical components. In particular, the laser damage of coatings in the amplifiers and in post-compression optics have become a bottleneck. The robustness of optical coatings is typically evaluated numerically through steady-state simulations of electric field enhancement in multilayer stacks. However, this approach cannot capture crucial characteristics of femtosecond laser induced damage (LID), as it only considers the geometry of the multilayer stack and the optical properties of the materials composing the stack. This approach neglects that in the interaction of an ultrashort pulse and the materials there is plasma generation and associated material modifications. Here, we present a numerical approach to estimate the LID threshold of dielectric multilayer coatings based on strong field electronic dynamics. In this dynamic scheme, the electric field propagation, photoionization, impact ionization, and electron heating are incorporated through a finite-difference time-domain algorithm. We applied our method to simulate the LID threshold of bulk fused silica, and of multilayer dielectric mirrors and gratings. The results are then compared with experimental measurements. The salient aspects of our model, such as the implementation of the Keldysh photoionization model, the impact ionization model, the electron collision model for 'low'-temperature, dense plasma, and the LID threshold criterion for few-cycle pulses are discussed.

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