Specific features of the structure and properties of arc-PVD coatings depending on the spatial arrangement of the sample in the chamber

The paper considers the influence of the spatial arrangement of samples in the unit chamber on parameters of deposited coatings when using a vacuum arc evaporator with controlled accelerated motion of a cathode spot of Arc-PVD (CAA-PVD) compared to a standard used in NNW6.6 evaporator with magnetic cathode spot retention by axial field. The distance from a sample to the cathode surface and an offset of the sample about the central axis of the cathode were varied. The study reveals the regular patterns' influence on the spatial sample arrangement on coating properties, such as thickness, microhardness, surface macroparticle content density, and crystal structure. Using the CAA-PVD technology allows reducing the distance from the cathode surface to the samples from 230 to 150 mm, forming a coating with a higher microhardness and lower density of microparticles than the standard used in NNW6.6 evaporator. It is found that a CAA-PVD evaporator forms a coating with a higher hardness and lower density of microparticles compared to a NNW6.6 evaporator. The application of the CAAPVD technology significantly (by 30-270%) reduces the density of microparticles on the coating surface, and the coating is characterized by a more uniform thickness and distribution of microparticle density.

Automated summary

This paper investigates the influence of the spatial arrangement of samples in a vacuum arc evaporator on the parameters of deposited coatings. The use of CAA-PVD technology results in coatings with higher hardness and lower microparticle density compared to the standard NNW6.6 evaporator. CAAPVD significantly reduces the microparticle density on the coating surface and improves the uniformity of thickness and microparticle distribution.