Time-resolved electron energy distribution functions at the substrate during a HiPIMS discharge with cathode voltage reversal

The time-dependent plasma properties of a high-power impulse magnetron sputtering plasma are investigated which include a positive 'kick' pulse on the sputtering target 2 mu s after the main negative pulse, this reversing the voltage on the cathode. At a substrate 15 cm distant from the magnetron, the time-dependent electron energy distribution function (EEDF), plasma potential, potential commute time and plasma diffusion properties are measured using a single Langmuir probe. Results show that the positive pulse on the target expels plasma and raises the plasma potential across the chamber on the order of 1 to 2 mu s, which is the time scale of the electron diffusion. The EEDF at the substrate fits a Druyvesteyn distribution during the main negative pulse rising slightly in average energy over time. The distribution is still Druyvesteyn and at the very start of the positive pulse, but then loses the higher energy electrons and drops in average electron energy as the positive pulse progresses. A Boltzmann equation solver, BOLSIG+, was used to predict the EEDF at the substrate during the positive pulse and it agrees best with the measurements assuming a value of 0.2 Td for the E/N (electric field/gas number density).

Automated summary

This study investigates the time-dependent plasma properties of a high-power impulse magnetron sputtering plasma, including the effect of a positive 'kick' pulse on the sputtering target. The results show that the positive pulse expels plasma and increases the plasma potential across the chamber. The study also measures the time-dependent electron energy distribution function, potential commute time, and plasma diffusion properties.