Journal
OPTICS EXPRESS
Volume 30, Issue 9, Pages 14189-14201Publisher
Optica Publishing Group
DOI: 10.1364/OE.452826
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Funding
- National Science Foundation [CQIS ECCS-1810233, EFRI ACQUIRE 5710004174, NNCI ECCS-2025158, STC DMR-1231319]
- Office of Naval Research [MURI N00014-15-1-2761, MURI N00014-20-1-2425]
- U.S. Department of Energy [HEADS-QON DE-SC0020376]
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Diamond has good optical properties and has been successfully used for quantum photonic devices operating at visible wavelengths. However, fabricating larger devices for telecommunication wavelengths has been challenging. This study evaluated different mask materials and found that a thick hydrogen silesquioxane layer on a thin alumina adhesion layer produced the best etch profile and optical performance.
Diamond offers good optical properties and hosts bright color centers with long spin coherence times. Recent advances in angled-etching of diamond, specifically with reactive ion beam angled etching (RIBAE), have led to successful demonstration of quantum photonic devices operating at visible wavelengths. However, larger devices operating at telecommunication wavelengths have been difficult to fabricate due to the increased mask erosion, arising from the increased size of devices requiring longer etch times. We evaluated different mask materials for RIBAE of diamond photonic crystal nanobeams and waveguides, and how their thickness, selectivity, aspect ratio and sidewall smoothness affected the resultant etch profiles and optical performance. We found that a thick hydrogen silesquioxane (HSQ) layer on a thin alumina adhesion layer provided the best etch profile and optical performance. The techniques explored in this work can also be adapted to other bulk materials that are not available heteroepitaxially or as thin films-on-insulator. (C) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
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