Journal
OPTICS EXPRESS
Volume 30, Issue 7, Pages 11959-11972Publisher
Optica Publishing Group
DOI: 10.1364/OE.452954
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Funding
- Electronics and Telecommunications Research Institute (ETRI)
- Development of the Technologies for ICT Materials, Components and Equipment [21ZB1200]
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This study demonstrates the successful fabrication of a double-layer nano-structure on silicon nitride using a dry process. The integration of this nano-structure in OLED encapsulation material enhances current efficiency and improves the display performance.
Even though it is in high demand to introduce a nano-structure (NS) light extraction technology on a silicon nitride to be used as a thin film encapsulation material for an organic light-emitting diode (OLED), only an industry-incompatible wet method has been reported. This work demonstrates a double-layer NS fabrication on the silicon nitride using a two-step organic vapor phase deposition (OVPD) of an industry-compatible dry process. The NS showed a wrinkle-like shape caused by coalescence of the nano-lenses. The NS integrated top-emitting OLED revealed 40 percent enhancement of current efficiency and improvement of the luminance distribution and color change according to viewing angle. (C) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
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