4.6 Article

Low-temperature deposition of CuAl2O4 thin film photocatalyst by ultrasonic spray pyrolysis

Journal

MATERIALS LETTERS
Volume 311, Issue -, Pages -

Publisher

ELSEVIER
DOI: 10.1016/j.matlet.2021.131620

Keywords

Thin Film; Ultrasonic spray pyrolysis; Photocatalytic; Organic dye

Funding

  1. Ministry of Education, Culture, Research and Technology, Republic of Indonesia, under the scheme of World Class Research (WCR) [3490/LL3/KR/2021 (0208/UP-WR3.1/PJN/IV/2021)]

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A single-phase CuAl2O4 thin film with porous microstructure was successfully synthesized at a low temperature using ultrasonic spray pyrolysis method. The synthesized film showed good photocatalytic performance in decomposing methylene blue dye under solar irradiation.
The formation of CuAl2O4 requires high processing temperature (T > 600 degrees C). In the present study, single phase CuAl2O4 thin film with porous microstructure was successfully synthesized at a low temperature of 400 degrees C using ultrasonic spray pyrolysis method. The FTIR result confirmed the presence of Cu-O and Al-O vibration from spinel CuAl2O4. The CuAl2O4 thin film with bandgap of 2.4 eV showed a good photocatalytic characteristic in decomposing methylene blue dye with efficiency of above 80% under solar irradiation for 3 hours.

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