Related references
Note: Only part of the references are listed.Thermal atomic layer etching: A review
Andreas Fischer et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2021)
Spontaneous Etching of Metal Fluorides Using Ligand-Exchange Reactions: Landscape Revealed by Mass Spectrometry
Ann Lii-Rosales et al.
CHEMISTRY OF MATERIALS (2021)
Volatile Etch Species Produced during Thermal Al2O3 Atomic Layer Etching
Joel W. Clancey et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2020)
Thermal etching of AlF3 and thermal atomic layer etching of Al2O3
Andreas Fischer et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2020)
Self-Limiting Temperature Window for Thermal Atomic Layer Etching of HfO2 and ZrO2 Based on the Atomic-Scale Mechanism
Rita Mullins et al.
CHEMISTRY OF MATERIALS (2020)
Mechanisms of Thermal Atomic Layer Etching
Steven M. George
ACCOUNTS OF CHEMICAL RESEARCH (2020)
Modeling the Chemical Mechanism of the Thermal Atomic Layer Etch of Aluminum Oxide: A Density Functional Theory Study of Reactions during HF Exposure
Suresh Kondati Natarajan et al.
CHEMISTRY OF MATERIALS (2018)
Atomic Layer Etching: Rethinking the Art of Etch
Keren J. Kanarik et al.
JOURNAL OF PHYSICAL CHEMISTRY LETTERS (2018)
Competition between Al2O3 atomic layer etching and AlF3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride
Jaime W. DuMont et al.
JOURNAL OF CHEMICAL PHYSICS (2017)
Directional etch of magnetic and noble metals. II. Organic chemical vapor etch
Jack Kun-Chieh Chen et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2017)
WO3 and W Thermal Atomic Layer Etching Using Conversion-Fluorination and Oxidation-Conversion-Fluorination Mechanisms
Nicholas R. Johnson et al.
ACS APPLIED MATERIALS & INTERFACES (2017)
Thermal Atomic Layer Etching of Titanium Nitride Using Sequential, Self-Limiting Reactions: Oxidation to TiO2 and Fluorination to Volatile TiF4
Younghee Lee et al.
CHEMISTRY OF MATERIALS (2017)
Thermal Selective Vapor Etching of TiO2: Chemical Vapor Etching via WF6 and Self-Limiting Atomic Layer Etching Using WF6 and BCl3
Paul C. Lemaire et al.
CHEMISTRY OF MATERIALS (2017)
Thermal Atomic Layer Etching of SiO2 by a Conversion-Etch Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride
Jaime W. DuMont et al.
ACS APPLIED MATERIALS & INTERFACES (2017)
Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions
Steven M. George et al.
ACS NANO (2016)
Trimethylaluminum as the Metal Precursor for the Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions
Younghee Lee et al.
CHEMISTRY OF MATERIALS (2016)
Atomic Layer Deposition of AlF3 Using Trimethylaluminum and Hydrogen Fluoride
Younghee Lee et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2015)
Pyrolysis of Alucone Molecular Layer Deposition Films Studied Using In Situ Transmission Fourier Transform Infrared Spectroscopy
Jaime W. DuMont et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2015)
First principles phonon calculations in materials science
Atsushi Togo et al.
SCRIPTA MATERIALIA (2015)
Atomic Layer Etching of HfO2 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and HF
Younghee Lee et al.
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2015)
Plasma etching: Yesterday, today, and tomorrow
Vincent M. Donnelly et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2013)
Developments of plasma etching technology for fabricating semiconductor devices
Haruhiko Abe et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2008)
Matrix isolation infrared spectroscopic and theoretical study of the hydrolysis of boron dioxide in solid argon
Yu Gong et al.
JOURNAL OF PHYSICAL CHEMISTRY A (2008)
Isotropic etching of silicon in fluorine gas for MEMS micromachining
Leonel R. Arana et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2007)
A new perspective in the Lewis acid catalyzed ring opening of epoxides. Theoretical study of some complexes of methanol, acetic acid, dimethyl ether, diethyl ether, and ethylene oxide with boron trifluoride
Patricia Saenz et al.
JOURNAL OF PHYSICAL CHEMISTRY A (2006)
Atomic layer deposition of B2O3 thin films at room temperature
Matti Putkonen et al.
THIN SOLID FILMS (2006)
Why is hydrofluoric acid a weak acid? -: art. no. 184501
P Ayotte et al.
JOURNAL OF CHEMICAL PHYSICS (2005)
ATR-FTIR spectroscopic studies of boric acid adsorption on hydrous ferric oxide
D Peak et al.
GEOCHIMICA ET COSMOCHIMICA ACTA (2003)
Etch rates for micromachining processing - Part II
KR Williams et al.
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS (2003)
Atomic layer deposition of ultrathin and conformal Al2O3 films on BN particles
JD Ferguson et al.
THIN SOLID FILMS (2000)
Infrared spectroscopic analysis of the Si/SiO2 interface structure of thermally oxidized silicon
KT Queeney et al.
JOURNAL OF APPLIED PHYSICS (2000)